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1、LithographyandDesigninPartnership:ANewRoadmap∗AndrewB.KahngUCSDDepartmentsofCSEandECE,LaJolla,CA92093-0404USAabk@ucsd.eduABSTRACTWediscussthenotionofa‘sharedtechnologyroadmap’betweenlithographyanddesignfromseveralperspectives.First,weexamineculturalgapsandotherintrinsicbarrierstoashar
2、edroadmap.Second,wediscusshowlithographytechnol-ogycanchangethedesigntechnologyroadmap.Third,wediscusshowdesigntechnologycanchangethelithographytechnologyroadmap.Weconcludewithanexampleofthe‘flavor’oftechnologyroadmappingactivitythatcantrulybridgelithographyanddesign.1.INTRODUCTIONInth
3、ispaper,weexplorethenotionofasharedtechnologyroadmapbetweenlithographyanddesign.Thepotentialbenefitsofa‘sharedroadmap’areimmense:asnotedin[8,9],thereisapromiseoffeasible(or,muchlessexpensive)solutionstoITRS‘redbricks’(technologyrequirementswithnoknownsolution)[11],givenappropriatenewme
4、chanismsforcollaborationandsynergybetweendisparatetechnologydomains.However,itisdifficulttoenvision,letaloneattain,asharedroadmapbetweenlithoanddesignbecause(1)manyculturalgapsseparatetherespectiveR&Dcommunities,and(2)thedrivingmetrics,andtargetvaluesforthesemetrics,arenotobvious.Inthi
5、sintroductorysection,webrieflyillustratethescopeofexistingculturalgaps;theconcludingsectionofthispaperillutrateshowsharedmetricsandtargetvaluesmightbeobtainedinaprincipledmannerforlithographyanddesign.Culturalgapsbetweenlithographyanddesignareapparentevenatthelevelofbasicconcepts.These
6、servetoalertustothelikelihoodof‘disconnects’.•Tothelithographer,thedesignissimplyasetofpolygons;theoriginofthepolygonsisunknown,anditisirrelevantwhetherthepolygonscompriseanarithmeticunitorastatemachineoranA-to-Dconverter.Tosellawafer,CDsandWATIon/Ioffmeasurementsmustbeverified.Goingth
7、eotherway,tothedesigner,lithographyandindeedtheentiremanufacturingprocessiscapturedbytheBSIMSPICEmodelanditscorners;theoriginandmethodofobtainingthismodel–and,inparticular,itscorners–areunknown.Tosellachip,chip-levelpowerandtimingspecificationsareverifiedonthetester.•Differentmindsetsca
8、nalso
