New antireflective coatings for 193-nm lithography.pdf

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1、NewAntireflectiveCoatingsfor193nmLithographyGuXu,DouglasJ.GuerreroandNormanDobsonBrewerScienceInc.,2401BrewerDrive,Rolla,MO65401ABSTRACTNewbottomantireflectivecoatings(I3ARCs)for193nmlithographyhavebeenrecentlydevelopedbyBrewerScienceInc.Copolymersofbenzylmeth

2、acrylate(orbenzylacrylate)andhydroxypropylmethacrylatehavebeensynthesizedandusedasamaincomponentin193rimBARCs.Theacryliccopolymershavestrongabsorbanceat193nmUVlightwavelength.The193nmBARCswereformulatedinsafesolventssuchasethyllactateandformedbyspin-oncoatingp

3、rocess.Thermosettingofthe193nmBARCslimitedtheirintermixingwithphotoresists.These193nmBARCshadopticaldensityofabout10pm1,k=0.35,andn=1.81.Preliminaryoxygenplasmaetchrateswere>1.5timesDUVresists.Goodprofilesatsmallfeaturesizes(<0.20iim)wereachievedwithtestedphot

4、oresists.Keywords:193nmlithography,antireflectivecoating,acrylicpolymers.1.INTRODUCTIONItiswellknown1thatthereflectivityofphotoresistsandsemiconductorsubstratesat193rimwavelengthisveryhighandcriticaldimension(CD)controlfor193nmlithographybecomesverydifficultwi

5、thoutusingantireflectivetechnologies.Onesolutiontothesereflectiveproblemsisusingbottomorganicantireflectivecoatings(BARCs)whichweredesignedforeliminatingstandingwaves,reflectivenotchingandbackscatteringlightfromgrainysubstrates.BARCstechnologieshavebeenwidelyu

6、seding-line,i-line25andDUVblithographies.AlthoughthebodyknowledgeofBARCshavebeenaccumulatedfortwodecades,developmentofsuccessful193nmBARCsisstillanothernewchallenge.CompatibilityofBARCswithphotoresistpolymersisimportantregardingtotheirprocessingperformance.Inc

7、ompatibilitycancausepooradhesionbetweenBARCsandphotoresist,andprecipitationofpolymersinthedrainlines.Therearethreepolymerfamilieswidelystudiedin193nmphotoresistdevelopment,i.e.,acrylicpolymer,maleicanhydridealternatingcopolymersandcyclicolefinpolymers.Thepolym

8、ersusedfor193nmBARCsinthisstudywereacryliccopolymerswhichprovidegoodcompatibilitywithfuture193nmphotoresists.Thechromophoreattachedtotheacryliccopolymerwasaphenylringwhichhasstrong