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ID:34933051
大小:1.12 MB
页数:8页
时间:2019-03-14
《New antireflective coatings for 193-nm lithography.pdf》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、NewAntireflectiveCoatingsfor193nmLithographyGuXu,DouglasJ.GuerreroandNormanDobsonBrewerScienceInc.,2401BrewerDrive,Rolla,MO65401ABSTRACTNewbottomantireflectivecoatings(I3ARCs)for193nmlithographyhavebeenrecentlydevelopedbyBrewerScienceInc.Copolymersofbenzylmeth
2、acrylate(orbenzylacrylate)andhydroxypropylmethacrylatehavebeensynthesizedandusedasamaincomponentin193rimBARCs.Theacryliccopolymershavestrongabsorbanceat193nmUVlightwavelength.The193nmBARCswereformulatedinsafesolventssuchasethyllactateandformedbyspin-oncoatingp
3、rocess.Thermosettingofthe193nmBARCslimitedtheirintermixingwithphotoresists.These193nmBARCshadopticaldensityofabout10pm1,k=0.35,andn=1.81.Preliminaryoxygenplasmaetchrateswere>1.5timesDUVresists.Goodprofilesatsmallfeaturesizes(<0.20iim)wereachievedwithtestedphot
4、oresists.Keywords:193nmlithography,antireflectivecoating,acrylicpolymers.1.INTRODUCTIONItiswellknown1thatthereflectivityofphotoresistsandsemiconductorsubstratesat193rimwavelengthisveryhighandcriticaldimension(CD)controlfor193nmlithographybecomesverydifficultwi
5、thoutusingantireflectivetechnologies.Onesolutiontothesereflectiveproblemsisusingbottomorganicantireflectivecoatings(BARCs)whichweredesignedforeliminatingstandingwaves,reflectivenotchingandbackscatteringlightfromgrainysubstrates.BARCstechnologieshavebeenwidelyu
6、seding-line,i-line25andDUVblithographies.AlthoughthebodyknowledgeofBARCshavebeenaccumulatedfortwodecades,developmentofsuccessful193nmBARCsisstillanothernewchallenge.CompatibilityofBARCswithphotoresistpolymersisimportantregardingtotheirprocessingperformance.Inc
7、ompatibilitycancausepooradhesionbetweenBARCsandphotoresist,andprecipitationofpolymersinthedrainlines.Therearethreepolymerfamilieswidelystudiedin193nmphotoresistdevelopment,i.e.,acrylicpolymer,maleicanhydridealternatingcopolymersandcyclicolefinpolymers.Thepolym
8、ersusedfor193nmBARCsinthisstudywereacryliccopolymerswhichprovidegoodcompatibilitywithfuture193nmphotoresists.Thechromophoreattachedtotheacryliccopolymerwasaphenylringwhichhasstrong
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