SEMI P22-0699 GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION

《SEMI P22-0699 GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION》由会员上传分享，免费在线阅读，更多相关内容在行业资料-天天文库。

1、SEMIP22-0699GUIDELINEFORPHOTOMASKDEFECTCLASSIFICATIONANDSIZEDEFINITIONThisguidelinewastechnicallyapprovedbytheGlobalMask&MaskEquipmentCommitteeandisthedirectresponsibilityoftheJapaneseMask&MaskEquipmentCommittee.CurrenteditionapprovedbytheJapaneseRegionalStandar

2、dsCommitteeonMarch17,1999.InitiallyavailableonSEMIOnLineApril1999;tobepublishedJune1999.Originallypublishedin1993.2)CornerIntrusion(SeeFigures6,28,30)1Purpose5.1.1.4Bridge—shapedefectswhichareadjacentto1.1Thepurposeofthisguidelineistoestablishstan-morethantwoedg

3、es.dardnomenclatureforphotomaskdefectclassifications,andtodefinedefectsizingmethods.1)OpaqueBridge(SeeFigures7,26)2)ClearBridge(SeeFigure8)2Scope5.1.2SizeDefect—aphotomaskpatternwhosesizeis2.1Itisdesirabletofollowthisguidelinewhendifferentfromitsintendeddesignpa

4、ttern.discussingclassification,nomenclature,andsizeofthephotomaskdefects.1)Oversize(onopaquepattern)(SeeFigure9)2)Oversize(onclearpattern)(SeeFigure10)3References3)Undersize(onopaquepattern)(SeeFigure11)3.1SEMIStandardSEMIP33—ProvisionalSpecificationFor4)Undersi

5、ze(onclearpattern)(SeeFigure12)Developmental230mmSquareHardSurface5)Elongation(onopaquepattern)(SeeFigure13)PhotomaskSubstrates.6)Elongation(onclearpattern)(SeeFigure14)4Terminology7)Truncation(onopaquepattern)(SeeFigure15)4.1designpattern—patternofintendeddesig

6、ndata.8)Truncation(onclearpattern)(SeeFigure16)4.2photomaskpattern—patternonphotomask5.1.3MisplacementDefect—aphotomaskpatternsurface.whoseplacementisdifferentfromitsintendeddesign.4.3Manytermsrelatingtophotomasktechnologycan(SeeFigures17,18,25)befoundinSEMIP33.

7、5.1.4TransmissionDefect—aphotomaskpatternwhosetransmissionisdifferentfromitsintended5ClassificationoftheMaskDefectdesign.5.1MaskPatternDefects1)TransmissionDefect(onclearpattern)(SeeFigure19)5.1.1ShapeDefect—aphotomaskpatternwhoseshapeisdifferentfromitsintendedd

8、esignpattern.2)TransmissionDefect(onopaquepattern)(SeeFigure20)5.1.1.1IsolatedDefect—shapedefectswhichareisolatedfrompattern.5.1.5Missingpatterndefect—aphotomaskpatte