Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf

Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf

ID:49395227

大小:391.57 KB

页数:5页

时间:2020-02-29

Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf_第1页
Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf_第2页
Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf_第3页
Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf_第4页
Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf_第5页
资源描述:

《Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM.pdf》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库

1、Chin.Phys.BVol.26,No.1(2017)018501Impactofneutron-induceddisplacementdamageonthesingleeventlatchupsensitivityofbulkCMOSSRAMXiao-YuPan(潘霄宇),Hong-XiaGuo(郭红霞)†,Yin-HongLuo(罗尹虹),Feng-QiZhang(张凤祁),Li-LiDing(丁李利),Jia-NanWei(魏佳男),andWenZhao(赵雯)NorthwestInstituteofNuclearTechnol

2、ogy,Xi’an710024,China(Received3August2016;revisedmanuscriptreceived26September2016;publishedonline30November2016)SincethedisplacementdamageinducedbytheneutronirradiationpriorhasnegligibleimpactontheperformanceofthebulkCMOSSRAM,weusetheneutronirradiationtodegradetheminori

3、tycarrierlifetimeintheregionsresponsibleforlatchup.Withtheexperimentalresults,wediscusstheimpactoftheneutron-induceddisplacementdamageontheSELsensitivityandqualitativeanalyzetheeffectivenessofthissuppressionapproachwithTCADsimulation.Keywords:displacementdamage,neutronir

4、radiation,singleeventlatchup,TCADsimulationPACS:85.30.De,61.80.–x,73.40.QvDOI:10.1088/1674-1056/26/1/0185011.Introductionsitiveoneistheminoritycarrierlifetime.AdecreaseintheminoritycarrierlifetimeleadstoadecreaseintheparasiticSingleeventlatchup(SEL)inspaceandatthegroundb

5、ipolartransistorgainandreducesthelatchupsensitivityofisoneofthemostwell-knownharderrors,whichisinherentbulkCMOSSRAM.totheCMOSICs.Thechargeinducedbytheioncanmod-ifytheelectricalfieldandpossiblytriggertheparasiticfour-TheaimofthispaperistoverifytheeffectivenessoflayerP–N–P–

6、Nstructure.[1–3]Underthiscircumstance,thetheneutronirradiationhardeningstrategy.Thebroadbeamreverse-biasedjunctionsbecomeconductive,resultingintheheavyionexperimentandthepulsedlaserexperimentwerelossoffunctionalityordevicedestruction.Tosuppressthisperformedtosupportourco

7、nclusion.Furthermore,thetech-phenomenon,manyhardeningmethodshavebeendevelopednologyassistedcomputeraideddesign(TCAD)simulationtomitigatetheSEL,suchasepitaxiallayer,guardrings,shal-toolwasutilizedtoexploretheunderlyingmechanismofthislowtrenchisolation,andsilicononinsulato

8、r(SOI)technology.hardeningstrategy.However,thesemethodswillchangetheinherentstructureandtechnologicalpr

当前文档最多预览五页,下载文档查看全文

此文档下载收益归作者所有

当前文档最多预览五页,下载文档查看全文
温馨提示:
1. 部分包含数学公式或PPT动画的文件,查看预览时可能会显示错乱或异常,文件下载后无此问题,请放心下载。
2. 本文档由用户上传,版权归属用户,天天文库负责整理代发布。如果您对本文档版权有争议请及时联系客服。
3. 下载前请仔细阅读文档内容,确认文档内容符合您的需求后进行下载,若出现内容与标题不符可向本站投诉处理。
4. 下载文档时可能由于网络波动等原因无法下载或下载错误,付费完成后未能成功下载的用户请联系客服处理。