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1、ElectronicSupplementaryMaterial(ESI)forRSCAdvances.Thisjournalis©TheRoyalSocietyofChemistry2015Electronicsupplementaryinformation(ESI)EngineeringmicrotubularSnO2architechtureassembledbyinterconnectednanosheetsforhighlithiumstoragecapacityXinyuZhaoa,b,Bi
2、ngLiua,andMinhuaCao*aaKeyLaboratoryofClusterScience,MinistryofEducationofChina,BeijingKeyLaboratoryofPhotoelectronic/ElectrophotonicConversionMaterials,DepartmentofChemistry,BeijingInstituteofTechnology,Beijing100081,P.R.China.Fax:+86-10-68912631;Tel:+8
3、6-10-68918468;E-mail:caomh@bit.edu.cnbSchoolofPetrochemicalEngineering,ShenyangUniversityofTechnology,Liaoyang111003,P.R.ChinaFig.S1TheSAEDpatternofhollowSnO2microtubes.TableS1Thedetailedexperimentalconditions.Temperature,ExperimentMaterialsQuantitytime
4、INH4F+cotton14mmol+300mg180oC,24hIISnCl2·2H2O+cotton7mmol+300mg180oC,24hNH4F+SnCl2·2H2O+III7mmol+14mmol+300mg180oC,24hcottonFig.S2SEMimagesofthecottontreatedbyNH4Fatthetemperatureof180ºC.(a)(b)Fig.S3SEMimageofthenanoparticlefilm.Fig.S4SEMimagesofthesamp
5、lesobtainedwithdifferentconcentrationsofSnCl2·2H2O.(a,e:1mmol;b,f:3mmol;c,g:5mmol;d,h:15mmol).TableS2ThepHvalueofthesolutionbeforeandafterhydrothermaltreatment.BeforeHydrothermalAfterHydrothermalExperimentMaterialstreatmenttreatmentINH4F+Water5.485.50II
6、SnCl2·2H2O+Water1.651.00IIISnCl2·2H2O+NH4F+Water2.612.19Fig.S5TheTGAcurveofthehollowSnO2microtubes(Redline)andcotton(Blackline).(theinsetisTGAcurveofhollowSnO2microtubesinthenarrowrangeof96.5to100%)100SnO2microtubes100.099.5HollowSnOmicrotubes)802)99.0%
7、%(98.50th060ige98.0W97.5(1t97.0hig4096.5100200300400500600700eTemperature(oC)CottonW200100200300400500600700oTemperature(C)Fig.S6(a)SEMimageand(b)XRDpatternofcommercialSnO2.(b).).ua(yitsntenI203040506070802(degree)Fig.S7SEMimagesofthehollowSnO2microtu
8、beelectrodeafter50cyclesofcharginganddischargingprocessesatarateof1C.Fig.S8CyclingperformanceofhollowSnO2microtubesandcommercialSnO2powerbetween50to100cyclesatarateof1C.1200)100-1)gCEofmicrotubes,1Ch(%A80,ym(800cnyit60iecicapMicr
