silicon germanium films deposited by low RF

silicon germanium films deposited by low RF

ID:39988659

大小:673.38 KB

页数:57页

时间:2019-07-16

silicon germanium films deposited by low RF_第1页
silicon germanium films deposited by low RF_第2页
silicon germanium films deposited by low RF_第3页
silicon germanium films deposited by low RF_第4页
silicon germanium films deposited by low RF_第5页
资源描述:

《silicon germanium films deposited by low RF》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库

1、UCRL-JRNL-215632Silicon-GermaniumFilmsDepositedbyLowFrequencyPECVD:EffectofH2andArDilutionA.Kosarev,A.Torres,Y.Hernandez,R.Ambrosio,C.Zuniga,T.E.Felter,R.R.Asomoza,Y.Kudriavtsev,R.Silva-Gonzalez,E.Gomez-Barojas,A.Ilinski,A.S.AbramovSeptember23,2005JournaloftheMaterialsResearchSocietyDisclaim

2、erThisdocumentwaspreparedasanaccountofworksponsoredbyanagencyoftheUnitedStatesGovernment.NeithertheUnitedStatesGovernmentnortheUniversityofCalifornianoranyoftheiremployees,makesanywarranty,expressorimplied,orassumesanylegalliabilityorresponsibilityfortheaccuracy,completeness,orusefulnessofan

3、yinformation,apparatus,product,orprocessdisclosed,orrepresentsthatitsusewouldnotinfringeprivatelyownedrights.Referencehereintoanyspecificcommercialproduct,process,orservicebytradename,trademark,manufacturer,orotherwise,doesnotnecessarilyconstituteorimplyitsendorsement,recommendation,orfavori

4、ngbytheUnitedStatesGovernmentortheUniversityofCalifornia.TheviewsandopinionsofauthorsexpressedhereindonotnecessarilystateorreflectthoseoftheUnitedStatesGovernmentortheUniversityofCalifornia,andshallnotbeusedforadvertisingorproductendorsementpurposes.1JMR-2004-0903acceptedtoJ.Mat.Res.Silicon-

5、GermaniumFilmsDepositedbyLowFrequencyPECVD:EffectofH2andArDilution1111123A.Kosarev,A.Torres,Y.Hernandez,R.Ambrosio,C.ZunigaT.E.Felter,R.Asomoza,34567Y.Kudriavtsev,R.Silva-Gonzalez,E.Gomez-Barojas,A.Ilinski,A.S.Abramov1InstituteNationalforAstrophysics,OpticsandElectronics,INAOE,Apdo.Postal.51

6、-216,CP7200,Puebla,Mexico2LawrenceLivermoreNationalLaboratory,Livermore,CA,94550,USA3CINVESTAV-IPN,Av.IPN#2508,Mexico,D.F.073604InstitutodeFisica,BenemeritaUniversidadAutonomadePuebla,Apdo.PostalJ-48,Puebla,Pue.,C.P.72570,Mexico5CIDS-IC,BenemeritaUniversidadAutonomadePuebla,Apdo.Postal1651,P

7、uebla,Pue.C.P.72000,Mexico67BenemeritaUniversidadAutonomadePuebla,Puebla,Puebla72050,MexicoA.F.IoffePhys.-TechnicalInstitute,St.-Petersburg,194021,RussiaAbstractWehavestudiedstructureandelectricalpropertiesofSi1-YGeY:HfilmsdepositedbylowfrequencyPE

当前文档最多预览五页,下载文档查看全文

此文档下载收益归作者所有

当前文档最多预览五页,下载文档查看全文
温馨提示:
1. 部分包含数学公式或PPT动画的文件,查看预览时可能会显示错乱或异常,文件下载后无此问题,请放心下载。
2. 本文档由用户上传,版权归属用户,天天文库负责整理代发布。如果您对本文档版权有争议请及时联系客服。
3. 下载前请仔细阅读文档内容,确认文档内容符合您的需求后进行下载,若出现内容与标题不符可向本站投诉处理。
4. 下载文档时可能由于网络波动等原因无法下载或下载错误,付费完成后未能成功下载的用户请联系客服处理。