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ID:14363419
大小:7.71 MB
页数:436页
时间:2018-07-28
《semiconductor nanostructures for optoelectronic applications - artech》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、SemiconductorNanostructuresforOptoelectronicApplicationsForalistingofrecenttitlesintheArtechHouseSemiconductorMaterialsandDevicesLibrary,turntothebackofthisbook.SemiconductorNanostructuresforOptoelectronicApplicationsToddSteinerEditorArtechHouse,Inc.Bos
2、ton•Londonwww.artechhouse.comLibraryofCongressCataloging-in-PublicationDataAcatalogrecordofthisbookisavailablefromtheU.S.LibraryofCongress.BritishLibraryCataloguinginPublicationDataSemiconductornanostructuresforoptoelectronicapplications—(ArtechHousesem
3、iconductormaterialsanddeviceslibrary)1.Semiconductors2.Nanostructuredmaterials3.OptoelectronicdevicesI.Steiner,Todd621.3’8152ISBN1-58053-751-0CoverdesignbyGaryRagaglia©2004ARTECHHOUSE,INC.685CantonStreetNorwood,MA02062Allrightsreserved.Printedandboundin
4、theUnitedStatesofAmerica.Nopartofthisbookmaybereproducedorutilizedinanyformorbyanymeans,electronicormechanical,includ-ingphotocopying,recording,orbyanyinformationstorageandretrievalsystem,withoutpermissioninwritingfromthepublisher.Alltermsmentionedinthi
5、sbookthatareknowntobetrademarksorservicemarkshavebeenappropriatelycapitalized.ArtechHousecannotattesttotheaccuracyofthisinforma-tion.Useofaterminthisbookshouldnotberegardedasaffectingthevalidityofanytrade-markorservicemark.InternationalStandardBookNumbe
6、r:1-58053-751-010987654321ContentsCHAPTER1Introduction11.1Synopsis11.2Growth11.3OptoelectronicDevicesBasedonSemiconductorNanostructures21.4MaterialsforSemiconductorNanostructures21.5Summary3CHAPTER2ReviewofCrystal,Thin-Film,andNanostructureGrowthTechnol
7、ogies52.1Introduction52.2ReviewofThermodynamics62.2.1ChemicalReactions72.2.2PhaseDiagrams72.3BulkCrystalGrowthTechniques82.3.1CzochralskiMethod82.3.2BridgmanMethod112.3.3Float-ZoneMethod132.3.4LelyGrowthMethods142.4EpitaxialGrowthTechniques162.4.1Liquid
8、PhaseEpitaxy162.4.2VaporPhaseEpitaxy172.4.3MolecularBeamEpitaxy202.4.4MetalorganicChemicalVaporDeposition242.4.5AtomicLayerEpitaxy292.5Thin-FilmDepositionTechniques292.5.1Plasma-EnhancedChemicalVaporDeposition292.5.2VacuumEvapora
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