SEMI E69-0298 TEST METHOD FOR DETERMINING REPRSEMI E70-0698

《SEMI E69-0298 TEST METHOD FOR DETERMINING REPRSEMI E70-0698》由会员上传分享，免费在线阅读，更多相关内容在行业资料-天天文库。

1、4SEMIE70-0698N/A©SEMI1998GUIDEFORTOOLACCOMMODATIONPROCESSNOTE:Thisentiredocumentwasrevisedin1998.1PurposeSEMIE49.3ÑGuideforUltrahighPurityDeionizedWaterandChemicalDistributionSystemsinSemicon-1.1ThisdocumentwillprovideanoverviewoftheductorManufacturingEquipment

2、variouselementsofToolAccommodation,amethodol-ogybywhichsemiconductorprocessingequipmentisSEMIE49.4ÑGuideforHighPuritySolventDistri-installedinacost-effectiveandtimelymanner.ThisbutionSystemsinSemiconductorManufacturingadditiontotheSEMIToolAccommodationStandards

3、EquipmentsetdescribestheprocessbywhichthereferencedSEMIE49.5ÑGuideforUltrahighPuritySolventSEMIdocumentscanbeeffectivelyusedtoachieveDistributionSystemsinSemiconductorManufacturingtoolinstallationcostandschedulegoals.Equipment2ScopeSEMIE49.6ÑGuideforSubsystemAs

4、semblyandTestingProcedures-StainlessSteelSystems2.1Thisoverviewdocumentwillprovideprocessdevelopment,facilities,manufacturing,andsalesengi-SEMIE49.7ÑGuideforSubsystemAssemblyandneers(aswellaspurchasingagentsandmanagers)withTestingProcedures-PolymerSystemsabasic

5、understandingofthevariouselementsinaToolSEMIE49.8ÑGuideforHighPurityGasDistributionAccommodationmethodology.Thisprocessempha-SystemsinSemiconductorManufacturingEquipmentsizesquality,completeness,timeliness,andcost-effec-tivenessaskeyelementsofsuccessfullyinstal

6、lingSEMIE49.9ÑGuideforUltrahighPurityGasDistri-semiconductorprocessingequipmentintowaferfabri-butionSystemsinSemiconductorManufacturingcationfacilities.Bydescribingagenericprocessßow,EquipmentthisdocumentidentiÞesaroadmapforusingpub-SEMIE51ÑGuideforTypicalFacil

7、itiesServicesandlishedstandardsthatcomprehendalltheproceduresTerminationMatrixinvolvedintoolaccommodationfromprocurement3.2OtherDocument1throughacceptance.Asacommongroundforcommu-nicationandcomparison,termsanddeÞnitionsarealsoFederalStandard209EÑAirborneParticu

8、lateClean-included.linessClassesinCleanroomsandCleanZones3ReferencedDocuments4SummaryofReferencedDocumentsNOTE:Alldocumentscitedwillbethelatestpublished4.1SEMIE6ÑFacilitiesI