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1、©2001OSA/OIC2001193/157nmUVcoatingsfornextgenerationphotolithography–AllaspectsHansLauthJENOPTIKLaser,Optik,SystemeGmbH,D-07739JenaGermanyAbstract:Thelithographymarketrequirescoatedopticalelementswithhighopticalperformance,minimizedopticallossesandaguaranteedli
2、fetime.Overthelastyearsachievedimprovementsweredonebyoptimizationofthewholesubstrateandcoatingmanufacturingprocess,thedevelopmentofnewmetrologyequipmentandtheuseofexcellentanalyticsandtestpossibilities.IntroductionOpticaltechnologieshaveessentialimportanceasdri
3、vingforcesofinnovationsinthemarketsofthe21stcentury.Theyarekeytechnologieswhichcreatetheconditionsforalotofnewdevelopmentsandtheirapplicationsinthefuture.Onetendencyofthedevelopmentofopticaltechnologiesleadstheusageofshorterandshorterwavelengths.Themicrolithogr
4、aphyaswellasthematerialprocessingbylasersmovetowardstotheusageofUVsources.Tofollowthistrendweconsiderthechallengesofcoatedopticalcomponents.Forarealapplication,itisnotpossibletoseparatebetweenacoatinganditssubstrate.Soitisimportanttodiscussgeneralaspectsfortheh
5、oleUVcomponentandspecialcoatingaspects.ChallengesandDemandsForboth,coatingandsubstrate,itisvalidthattherangeofmaterials,whichhaveagoodtransmissionandlowbulkabsorptiondecreasesconsiderablyifthewavelengthbecomesshorterandshorter.Whilesemiconductors,oxidesandfluor
6、idescanbeusedastransmittingmaterialsinthenearinfraredandvisiblewaveband,thesemiconductorsloosetheirmeaningintheultravioletspectralrange.Ifthewavelengthbecomessmallerthan190nm,inthesocalledVUVspectralrange,onlyfluoridesaresuitableastransmittingmaterials.Thepreci
7、sionisanveryimportantpointconcerningtheshape,roughness,microstructureofthesurfaces/coatingsandopticalcleanliness.Theserequirementsincreaserapidlyifthewavelengthchangesfrom550nmto157nm.Thesamerelativetolerancesarecausingadramaticriseoftheabsoluteaccuracyatshorte
8、rwavelengths.Further,shortwavelengthsleadtohighintrinsicandextrinsiclossesinthecoatedopticalcomponents.Theselossesarecharacterizedbybulkabsorption,surfaceandfilmabsorption,s
