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1、©2007OSA/OIC2007FA7.pdfFluorideantireflectioncoatingsat193nmbyresistiveheatingboatMing-ChungLiu,Cheng-ChungLeeThinFilmTechnologyCenter/DepartmentofOpticsandPhotonics,NationalCentralUniversity,Chung-Li,Taiwan320Email:mjlio@dop.ncu.edu.tw,cclee@dop.ncu.edu.twMasaakiKan
2、eko,KazuhideNakahira,YuuichiTakanoLensdivision,TochigiNikon,JapanAbstract:Fluoridematerials,MgF2、AlF3、LaF3andGdF3areusedforantireflectioncoatingsat193nmbyresistiveheatingboat.Opticalcharacteristics,microstructure,stress,andlaser-induceddamagethreshold(LIDT)ofthefilms
3、havebeeninvestigated.©2007OpticalSocietyofAmericaOCIScodes:(310.6860)Thinfilms,opticalproperties;(310.1210)Antireflection.1.IntroductionHighqualityopticalcoatingswithlowopticallossandhighcapabilityagainstlaserirradiationarerequiredforpracticaluseinDUVlithography.Fluo
4、rideantireflectioncoatingsareeffectivereductionofreflectanceofDUVopticalcomponents.However,therearefewmaterialsavailableforcoatinginDUVregion,becausethematerialmusthaslargeenergybandgap[1,2].Magnesiumfluoride(MgF2)andaluminumfluoride(AlF3)areusuallyusedaslowindexmate
5、rialinUVregion.Lanthanumfluoride(LaF3)andgadoliniumfluoride(GdF3)arethepotentialhighindexmaterialsinthewavelengthrangefrom130nmto200nm.Itshowedthatthefluoridethinfilmhaslessopticallosswhendepositedbyresistantheaterthermalevaporationthanbyotherdepositionmethodsincludi
6、ngelectronbeamthermalevaporation,magnetronsputtering,ionbeamassisteddepositionandionbeamsputtering[3-10].Inthisresearch,fluorideantireflectioncoatingswasdesignedanddepositedbyresistantheaterthermalevaporation.Therelationbetweenopticalcharacteristics,microstructure,st
7、ress,andLIDToffluorideantireflectioncoatingsonfusedsilicawereresearched.Thecharacteristicofantireflectioncoatingswereinvestigatedbyspectrometer,scanningelectronmicroscope(SEM),atomforcemicroscopy(AFM),stressmeasurementequipmentandArFexcimerlaserdamagemeasurementsyste
8、m.2.ExperimentFluoridethinfilms,MgF2、AlF3、LaF3andGdF3weredepositedviasublimationusingmolybdenumboatevaporationmethod.Beforetheevapo