asml 光刻机介绍

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1、ASMLScannerGeneralIntroductionCourseOverviewSystemOverviewBasicOperationRecoveryPAS5500WAFERSCANNEROVERVIEWPurposeThePAS5500isafullyautomaticstep-and-repeatcameraforexposingwafersusedformanufacturingofintegratedcircuits.Thesystemformspartofalithographicprocess,andissuitableforbatchprod

2、uctionoflargeandverylargescaleintegratedcircuits.SystemOverviewThePAS5500waferscannercomprisesthefollowingmainunits:Exposureunit,Wafertransportsystem,Operatorconsole,Electronicscabinet,ContaminationandTemperature(C&T)cabinet.SystemOverviewSystemOverviewSystemOverviewSAFETYOVERVIEWOFPOT

3、ENTIALHAZARDSThemainhazardsrelatedtothePAS5500/500,/550,/700are:Laserradiation,includinghighintensitydeepultraviolet(DUV)laserradiationof248nmLasergases,includingvery-toxicfluorineMechanicalmovements.Otherhazardsare:MagneticfieldsRemotecontroloftheunitusingtheRemoteMonitoringandControl

4、System(RMCS)SystemOverviewSystemOverviewSYMBOLSSYSTEMBUILDUPThemainunitsofthePAS5500canbefurtherdividedintothefollowingsubsystems:AM(AirMount)ARMS(AdvancedReticleManagementSystem)IRIS(IntegratedReticleInspectionSystem)WH(WaferHandling)LS(LevelSensor)SWS(ScanningWaferStage)SRS(ScanningR

5、eticleStage)AL(Alignment)IS(ImageSensor)IP&IL(IlluminationandProjection)OA(Off-Axisillumination,ATHENA)CT(ContaminationandTemperaturecontrol)SystemOverviewAirmountSeparatingmachineintotwoparts:SilentWorldandExternalWorldPurpose:VibrationIsolationPositionControlDiagnosticToolSub-Modules

6、Advancedreticlemanagementsystem(ARMS)PurposeThepurposeoftheARMS,istoprovideameansofautomaticallyretrievingandplacingthedesiredreticleaccuratelyonthereticletable.Toaccomplishthisthesystemmust:1.ControltheStandardMechanicalInterFace(SMIF)port,2.Identifythereticles,3.Loadandunloadreticles

7、to/fromthelibrary,4.Prealignthereticleonthereticletable,5.Placeandremovethereticleonthereticletable,6.Importtherelativemachineconstantsandlayoutdata(ifavailable)Sub-ModulesWAFERHANDLINGPurposeTheWHsystemhastwoprimaryfunctions.Itsfirstmaintaskistotransportwafersbetweenacarrier(orapede