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1、ASMLScannerGeneralIntroductionCourseOverviewSystemOverviewBasicOperationRecoveryPAS5500WAFERSCANNEROVERVIEWPurposeThePAS5500isafullyautomaticstep-and-repeatcameraforexposingwafersusedformanufacturingofintegratedcircuits.Thesystemformspartofalithographi
2、cprocess,andissuitableforbatchproductionoflargeandverylargescaleintegratedcircuits.SystemOverviewThePAS5500waferscannercomprisesthefollowingmainunits:Exposureunit,Wafertransportsystem,Operatorconsole,Electronicscabinet,ContaminationandTemperature(C&T)c
3、abinet.SystemOverviewSystemOverviewSystemOverviewSAFETYOVERVIEWOFPOTENTIALHAZARDSThemainhazardsrelatedtothePAS5500/500,/550,/700are:Laserradiation,includinghighintensitydeepultraviolet(DUV)laserradiationof248nmLasergases,includingvery-toxicfluorineMech
4、anicalmovements.Otherhazardsare:MagneticfieldsRemotecontroloftheunitusingtheRemoteMonitoringandControlSystem(RMCS)SystemOverviewSystemOverviewSYMBOLSSYSTEMBUILDUPThemainunitsofthePAS5500canbefurtherdividedintothefollowingsubsystems:AM(AirMount)ARMS(Adv
5、ancedReticleManagementSystem)IRIS(IntegratedReticleInspectionSystem)WH(WaferHandling)LS(LevelSensor)SWS(ScanningWaferStage)SRS(ScanningReticleStage)AL(Alignment)IS(ImageSensor)IP&IL(IlluminationandProjection)OA(Off-Axisillumination,ATHENA)CT(Contaminat
6、ionandTemperaturecontrol)SystemOverviewAirmountSeparatingmachineintotwoparts:SilentWorldandExternalWorldPurpose:VibrationIsolationPositionControlDiagnosticToolSub-ModulesAdvancedreticlemanagementsystem(ARMS)PurposeThepurposeoftheARMS,istoprovideameanso
7、fautomaticallyretrievingandplacingthedesiredreticleaccuratelyonthereticletable.Toaccomplishthisthesystemmust:1.ControltheStandardMechanicalInterFace(SMIF)port,2.Identifythereticles,3.Loadandunloadreticlesto/fromthelibrary,4.Prealignthereticleontheretic
8、letable,5.Placeandremovethereticleonthereticletable,6.Importtherelativemachineconstantsandlayoutdata(ifavailable)Sub-ModulesWAFERHANDLINGPurposeTheWHsystemhastwoprimaryfunctions.Itsfirstmaintaskistotransportwafersbetweenacarrier(orapede
