SEMI P30-0997 PRACTICE FOR CATALOG PUBLICATION OF CRITICAL

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1、SEMIP30-0997N/A©SEMI1997PRACTICEFORCATALOGPUBLICATIONOFCRITICALDIMENSIONMEASUREMENTSCANNINGELECTRONMICROSCOPES(CD-SEM)1Purpose4.6permissibleßoorloadingcapabilityÑThemini-mumßoorloadingcapabilitywheretheequipmentcan1.1ThepurposeofthispracticeistodeÞnetermsbesettled.lis

2、tedincriticaldimension-scanningelectronmicro-scopes(CD-SEM).4.7permissibleßoorvibrationÑThemaximumßoorvibrationthatcanprovidetheguaranteedresolution.1.2Thisdocumentisdesignedtocreatecommonunderstandingbetweensuppliersandusers.4.8permissibleairvibrationÑThemaximumairvi

3、brationthatcanprovidetheguaranteedresolution.2Scope4.9permissiblestraymagneticÞeldÑThemaximum2.1ThispracticeappliestotermslistedintheCD-changeinthestraymagneticÞeldthatcanprovidetheSEMcatalog.guaranteedresolution.2.2Thispracticealsoappliestotermslistedinthe4.10measura

4、blerangeÑMeasurementrangetoestimateandpurchasingspeciÞcation.guaranteestaticanddynamicrepeatabilityaswellaslinearity.Measuringdimensionsguaranteedtobe3ReferencedDocumentswithinthespeciÞcationofstaticrepeatability,dynamicNone.repeatability,andlinearity.4.11measurementp

5、atterndeterminationmethodÑ4TerminologyIdentiÞesthepatterntobemeasured.Thismethodis4.1acceleratingvoltageÑThemeankineticenergyusedtoidentifythepatterntobemeasured.Itisper-ofprimaryelectronsconvertedintovoltage.formedbyautomaticpatternrecognition,orinstruc-tionsfromtheo

6、perator.4.2alignmentÑCorrectscoordinatesforpositionsandspecimenstage.Matchingthecoordinatesofa4.11.1automaticpatterndeterminationmethodÑwaferandaspecimenstageinordertoaddressmea-Thepatternselectionmethodbasedontheautomaticsuredpatternsformedonawafer.patternrecognition

7、system.4.3alignmenterrorÑDistancefromthepatterncen-4.11.2manualpatterndeterminationmethodÑtertoscreencenterafteralignment.Thisisthemaxi-Operatorusescursors,etc.Thepatternselectionmumdistancebetweenthescreencenterandatargetmethodisaccomplishedbytheoperatorplacingcur-pa

8、tternafteraddressingbyitscoordinatesandcom-sorsonthemeasurementpattern.pletingalignment.4.12measurementprecision4.4CriticalD