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时间:2019-10-10
《世界半导体生产机台安全设计验收标准》由会员上传分享,免费在线阅读,更多相关内容在工程资料-天天文库。
1、世界半导体生产机台安全设计验收标准精品汇编资料GlobalSemiconductorSafetySendees,LLCSEMIS2-93AProductSafetyAssessmentFinalReport世界半导体生产机台安全设计验收标准AppliedMaterialsChemicalMechanicalPolishingSystemModel:MirraTrakCMP工艺应用材料June19,1998Preparedfor:AppliedMaterials3111CoronadoDriveSantaClara,CA9505
2、4Preparedby:GlobalSemiconductorSafetyServices,LLC1313GenevaDriveSunnyvale,CA94089GS3JobNo.980029GS3DocumentNo.980029F2Client・Confidential休代口约TheinformationusedtopreparethisreportwasbasedoninterviewswithAppliedMaterials5engineers.Theinformationwasalsobasedoninspectio
3、nsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak4、6,1996andtheresultsofthisevaluationwerealsoused.AllobservationsandrecommendationsarebasedonconditionsanddescriptionsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak,duringthetimeofdatacollectionanduponinformationmadeavailabletoGlobalSemiconductorSafetyServices5、.Thisreport'ssignificanceissubjecttotheadequacyandrepresentativecharacteristicsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak,andtothecomprehensivenessofthetests,examinationsand/orsurveysmade.ReferencetoGlobalSemiconductorSafetyServices,includingreproduction6、ofGlobalSemiconductorSafetyServices"servicemark,inpromotionalmaterials,ispermittedonlywithGlobalSemiconductorSafetyServices*expresswrittenconsentTheserviceperformedhasbeenconductedinaccordancewiththestandardscurrentlyacceptedinourprofession,andatthehighlevelofskilla7、ndcareexercisedbyGlobalSemiconductorSafetyServices^staff.Lastly,thisreporthasbeenpreparedasaClient-Confidentialdocument,intendedfortheexclusiveuseofAppliedMaterialsandforthepurposeofdocumentationtoSEMIS2-93A>Therefore,nooutsidedistributionwilloccurunlesswrittenautho8、rizationisprovidedbytheclienteTABLEOFCONTENTS目录SectionSection1.0MANAGEMENTSUMMARY(管理摘要)1Section2.0SCOPE(范围)2Section3.0SYSTEMDESCRIPTION(系统
4、6,1996andtheresultsofthisevaluationwerealsoused.AllobservationsandrecommendationsarebasedonconditionsanddescriptionsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak,duringthetimeofdatacollectionanduponinformationmadeavailabletoGlobalSemiconductorSafetyServices
5、.Thisreport'ssignificanceissubjecttotheadequacyandrepresentativecharacteristicsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak,andtothecomprehensivenessofthetests,examinationsand/orsurveysmade.ReferencetoGlobalSemiconductorSafetyServices,includingreproduction
6、ofGlobalSemiconductorSafetyServices"servicemark,inpromotionalmaterials,ispermittedonlywithGlobalSemiconductorSafetyServices*expresswrittenconsentTheserviceperformedhasbeenconductedinaccordancewiththestandardscurrentlyacceptedinourprofession,andatthehighlevelofskilla
7、ndcareexercisedbyGlobalSemiconductorSafetyServices^staff.Lastly,thisreporthasbeenpreparedasaClient-Confidentialdocument,intendedfortheexclusiveuseofAppliedMaterialsandforthepurposeofdocumentationtoSEMIS2-93A>Therefore,nooutsidedistributionwilloccurunlesswrittenautho
8、rizationisprovidedbytheclienteTABLEOFCONTENTS目录SectionSection1.0MANAGEMENTSUMMARY(管理摘要)1Section2.0SCOPE(范围)2Section3.0SYSTEMDESCRIPTION(系统
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