世界半导体生产机台安全设计验收标准

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1、世界半导体生产机台安全设计验收标准精品汇编资料GlobalSemiconductorSafetySendees,LLCSEMIS2-93AProductSafetyAssessmentFinalReport世界半导体生产机台安全设计验收标准AppliedMaterialsChemicalMechanicalPolishingSystemModel:MirraTrakCMP工艺应用材料June19,1998Preparedfor:AppliedMaterials3111CoronadoDriveSantaClara,CA9505

2、4Preparedby:GlobalSemiconductorSafetyServices,LLC1313GenevaDriveSunnyvale,CA94089GS3JobNo.980029GS3DocumentNo.980029F2Client・Confidential休代口约TheinformationusedtopreparethisreportwasbasedoninterviewswithAppliedMaterials5engineers.Theinformationwasalsobasedoninspectio

3、nsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak

4、6,1996andtheresultsofthisevaluationwerealsoused.AllobservationsandrecommendationsarebasedonconditionsanddescriptionsoftheChemicalMechanicalPolishingSystem，Model:MirraTrak,duringthetimeofdatacollectionanduponinformationmadeavailabletoGlobalSemiconductorSafetyServices

5、.Thisreport'ssignificanceissubjecttotheadequacyandrepresentativecharacteristicsoftheChemicalMechanicalPolishingSystem,Model:MirraTrak,andtothecomprehensivenessofthetests,examinationsand/orsurveysmade.ReferencetoGlobalSemiconductorSafetyServices,includingreproduction

6、ofGlobalSemiconductorSafetyServices"servicemark,inpromotionalmaterials,ispermittedonlywithGlobalSemiconductorSafetyServices*expresswrittenconsentTheserviceperformedhasbeenconductedinaccordancewiththestandardscurrentlyacceptedinourprofession,andatthehighlevelofskilla

7、ndcareexercisedbyGlobalSemiconductorSafetyServices^staff.Lastly,thisreporthasbeenpreparedasaClient-Confidentialdocument,intendedfortheexclusiveuseofAppliedMaterialsandforthepurposeofdocumentationtoSEMIS2-93A>Therefore,nooutsidedistributionwilloccurunlesswrittenautho

8、rizationisprovidedbytheclienteTABLEOFCONTENTS目录SectionSection1.0MANAGEMENTSUMMARY（管理摘要）1Section2.0SCOPE（范围）2Section3.0SYSTEMDESCRIPTION（系统