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ID:39130701
大小:3.18 MB
页数:69页
时间:2019-06-25
《高压沉积非晶硅锗薄膜与在太阳电池上的应用》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、AbstractFabricatingmulti-junctionsolarcellsisoneofkeystrategiesto1mproVetneconVersionefficiencyofsiliconbasedthinfilmsolarcells·Inthispaper,锄orphoussilicongenllani啪thinfilms,whichcanbeusedasintrinsiclayerofmlddlecell,waspreparedbyRF.PECVDunderhighpressureinordertoachieVeahlghdeposltlonra
2、te.Basedonincreasingdepositrateandlowcostofsourcinggas(ge衄锄eandsilanewasused),amorphoussilicongermaniumsolarcellsw盯eobtained,meetingmerequirementsoftriple-junctiontandemsolarcell·Themaincon‘ent8areasfollows:.(1)Theoptimizationofamorphoussilicongermaniumthinfilmatlowdepositionrate.一Influe
3、nceofprocessparametersonpropertiesofthinfilmweresystematicallyinvestigatedunderlowpressurecondition.Byadjustinggermaneconcen‘ratlonandRFpower,thegemani啪contentofthinfilmcanbecontrolled·Hydrogendilutloncanimprovetheuniformityofcontentsandmicro-structureaswellasbondmgtom·Thea.SiGematerials
4、weredepositedat0.8一lflds,withgermaniumcontentof40%,Dhotosensitivitylargerthan2×105andopticalgapof1·58eV·a‘SiGefilmdeposltedatlowratec眦beoptimizedoverawiderangeofprocesswindow·(21Theoptimizationofamorphoussilicongermaniumthinfilmunderhj班pressure.Comparedt0mecaseoflowpressure,thedeposition
5、rateofa-SiGethinfilmwasraised衄eetimeshigherbyincreasingpressureandpow盯denslty·I'heinfluencesofge眦aneconcentration,plasmapower,pressure,hydrogendllutionrateandresidenttimeonfilmpropertiesunderhighpressureprocesswasstudled·Themainresultsareconcludedasfollows:(a)MatchinggermaniumcontentandP
6、la8mapower.Over30%germaniumcontentcallsforplasmaPowerlessthan40W.(b)Matchingplasmapowerandgaspressure.3Torrpressurewasprel咐edaccordingwith40Wpower,inordertoavoidionbombardmenttothefilm.fc)Increasinghydrogendilutionwasnecessaryforoptimizingm1∞stmctureandAbstractbondingform.(d)Propertotalf
7、lowratewasusedtoattainproperresidenttimeofgas.Eventually,a-SiGematerialwithopticalgapof1.62eVandphotosensitivitymorethan103wasfabricatedunderhi曲pressurecondition.Withthisprocess,thedepositionratewasenhancedtO3.5·4JXJs.twotimeshigherthanthecaseoflowpressuredeposition.Never
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