ctp磁控溅射镀膜生产线详细方案书(detailed plan of ctp magnetron sputtering coating production line)

ctp磁控溅射镀膜生产线详细方案书(detailed plan of ctp magnetron sputtering coating production line)

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时间:2018-07-29

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1、ctp磁控溅射镀膜生产线详细方案书(DetailedplanofCTPmagnetronsputteringcoatingproductionline)Firstpages,6pagesofCTPmagnetronsputteringcoatingproductionlineschemeOverallstructuredescriptionof1.1verticalmagnetronsputteringcoatingproductionlineLaHunanmanufacturerXiangtanHongdavacuumtechnologyLimitedbyShareLtdLaHD

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5、ipmentsize4550mmThe*670mm*0.3-3mmplanarglasssubstrateexergyproductionmachineryislessthanorequalto75sintherhythmoftheproductionlineThemolecularpumpgastoformanatmosphereofisolationoftheadvanceddesignexergyproductionlineisequippedwith18setsofSHIMADZUJapanTMP-V2304LMmaglevmolecularpumpisusedtoobta

6、inefficientstablepumpingspeedanduniformgasdistribution.1equipmentdesignsizeincreaseThetotallengthofthemainvacuumchamberisobserved27mthesubjecttotheactualdesigninLa13500mmLtheprocesschamberoftheH*2200mm*500*W*1theactualstandardofthedesignintheNon1750mmLobservedthatthecoatingchamberoftheH*2200mm

7、*500*W*6theactualstandardofthedesignintheGatevalve150mmL*2200mm*La*H*500*W*4theactualstandardofthedesignintheFlapvalve150mmLaL*2200mm**H*500*W*2theactualstandardofthedesignintheTheLa1750mmLhandlingrack*1900mmH**6theactualstandardofthede

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