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大小:1.23 MB
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时间:2020-06-01
《步进式旋转光刻制备柱面微结构光栅模具.pdf》由会员上传分享,免费在线阅读,更多相关内容在应用文档-天天文库。
1、加工、测量与设备Processing,MeasurementandEquipment步进式旋转光刻制备柱面微结构光栅模具冯龙,蒋维涛,刘红忠,史永胜,尹磊(西安交通大学机械制造系统工程国家重点实验室,西安710049)摘要:相对于常规光栅制造方法(如机械刻划和光学曝光等工艺)而言,连续辊压印技术更易实现低成本、连续和高效的大面积制造。高精度栅结构辊压印圆柱辊模具的制备工艺技术是连续辊压印技术实现高精度光栅复制的关键技术。针对这一问题提出了一种步进式旋转光刻工艺路线,将小区域的微结构光栅掩模通过步进式拼接曝光方式实现模具表面整周完整光栅的曝光。区别于传统平面曝
2、光过程,筒形模具曲面曝光采用步进式旋转光刻工艺,其关键技术是:搭建高步进精度的旋转曝光工艺实验平台、解决筒形模具外径及光栅周期匹配问题和优化接近式拼接曝光工艺中的曝光间隙。通过理论分析和实验验证,得出了优化的步进旋转角度、筒形模具外径、光栅周期和接近式曝光间隙的条件,通过此工艺完成了柱面模具表面周期为20m级的光栅结构的制备,为采用辊压印技术实现低成本、连续和高效大面积光栅制造创造了有利条件。关键词:辊压印;复制;步进式旋转光刻;曝光间隙;光栅中图分类号:TN305.7文献标识码:A文章编号:1671—4776(2013)05—0316—06Fabricat
3、ionoftheGratingMoldwithMicro·-PatternsontheCylindricalSurfacebyStepRotatingLithographyFengLong,JiangWeitao,LiuHongzhong,ShiYongsheng,YinLei(StateKeyLaboratoryforManufacturingSystemsEngineering,X?anJiaotongUniversity,X?an710049,China)Abstract:Comparedwithconventionalgratingmanufactu
4、ringmethods(i.e.mechanicalmachi—ningprocessandopticalexposureprocess),continuousrollerimprintingispreferredtoachievelow—cost,continuousandefficientmanufacturingonlarge-area.Oneofthekeychallengesforrollerimprintingisthefabricationofgratingrollermoldwithcontinuoushigh——accuracymicro—
5、structuresoverthewholecylindricalsurface.Tothispoint。asteprotatinglithographyprocesswasproposed,inwhichcontinuousgratingstructuresoverthewholecylindricalsurfacewereachievedbystepsplicinglithographwiththegratingmaskwithsmallregionmicrostructures.Incontrasttotheconventionallithograph
6、yonplanarsurfaces,theexposureonthesurfaceofthecy—lindricalmoldtakesuseofthesteprotatinglithograph.Thekeytechnologiesaretosetuptheplatformforthesteprotatinglithographywithhigh—accuracyrotatingcontrol,solvethematchproblembetweenthecylindermolddiameterandthegratingperiod,andoptimizeth
7、eexposuregapintheproximitysplicinglithography.Withthetheoreticalanalysisandexperimentalverifica—tion,theoptimizationsofthesteprotatingangle,cylindricalmolddiameter,gratingperiodand收稿日期:2012—12-27基金项目:国家科技重大专项(04专项)资助项目(201lZX04014—071);中国博士后基金资助项目(2012M520081)通信作者:蒋维涛,E-mail:wtjian
8、g@mail.xjtu.edu.cn316Micro
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