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1、MaterialsResearchExpressPAPER•OPENACCESSRelatedcontent-Characterizationofthin-filmthicknessTemperaturedependentopticalconstantsforSiO2SaraPourjamal,HenrikMäntynen,PriitJaansonetal.filmonSisubstratebyellipsometry-Characterizationofsilicaxerogelfilmsbyvariable-anglesp
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5、boGong1,RuchenDai2,ZhongpingWang2,ChuanchaoZhang3,XiaodongYuan3andZengmingZhang2,412June20171DepartmentofPhysics,UniversityofScienceandTechnologyofChina,Hefei,Anhui230026,People’sRepublicofChinaACCEPTEDFORPUBLICATION2TheCentreofPhysicalExperiments,UniversityofScienc
6、eandTechnologyofChina,Hefei,Anhui230026,People’sRepublicofChina0850053July20173ResearchCenterofLaserFusion,ChinaAcademyofEngineeringPhysics,Mianyang,Sichuan621900,People’sRepublicofChinaPUBLISHED4KeyLaboratoryofStrongly-CoupledQuantumMatterPhysics,ChineseAcademyofSc
7、iences,SchoolofPhysicalSciences,2August2017UniversityofScienceandTechnologyofChina,Hefei,Anhui230026,People’sRepublicofChinaJGongetalE-mail:zzm@ustc.edu.cnOriginalcontentfromthisworkmaybeusedKeywords:SiO2,opticalconstants,temperature,refractiveindex,ellipsometryunde
8、rthetermsoftheCreativeCommonsSupplementarymaterialforthisarticleisavailableonlineAttribution3.0licence.Anyfurtherdistributionofthisworkmus
