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1、Softimprintlithographyofabulkchalcogenideglass1,2,*2,314JiriOrava,TomasKohoutek,A.LindsayGreer,andHiroshiFudouzi1DepartmentofMaterialsScienceandMetallurgy,UniversityofCambridge,PembrokeSt.,Cambridge,CB23QZ,UnitedKingdom2CentreforMaterialScience,UniversityofPardubice,Studentska95,Pardu
2、bice53210,CzechRepublic3OpticalFunctionalMaterialsLaboratory,ToyotaTechnologicalInstitute,2-12-1Hisakata,Tempaku,Nagoya,Aichi468-8511,Japan4NationalInstituteforMaterialsScience(NIMS),1-2-1Sengen,Tsukuba,Ibaraki305-0047,Japan1*jo316@cam.ac.ukAbstractWereportonlarge-surface-areamicro-pa
3、tterningofabulkchalcogenideglassbyaPDMSsoftmould.Micrometre-scale(width~4µmanddepth~0.8µm)testpatternssuchasribs,channelsandalensarrayaresuccessfullyimprintedintothesurfaceofhighrefractiveindexAs3S7bulkglassat225°Cwithoutanyappliedexternalpressure.Themean-squareroughnessofthepatterned
4、glasssurfaceisintherange3–10nm.Softimprintingofbulkchalcogenideglassisanefficientmethodforreliablefabricationofopticalandphotonicdevices.©2011OpticalSocietyofAmericaOCIScodes:(220.0220)Opticaldesignandfabrication;(120.2830)Heightmeasurements;(160.2750)Glassandotheramorphousmaterials;(
5、220.3740)Lithography.Referencesandlinks1.S.Y.Chou,P.R.Krauss,andP.J.Renstrom,“Nanoimprintlithography,”J.Vac.Sci.Technol.B14(6),4129–4133(1996).2.S.Y.Chou,P.R.Krauss,andP.J.Renstrom,“Imprintlithographywith25-nanometerresolution,”Science272(5258),85–87(1996).3.Y.XiaandG.M.Whitesides,“So
6、ftlithography,”Angew.Chem.Int.Ed.37(5),550–575(1998).4.Y.XiaandG.M.Whitesides,“Softlithography,”Annu.Rev.Mater.Sci.28(1),153–184(1998).5.J.E.tenElshof,S.U.Khan,andO.F.Göbel,“Micrometerandnanometer-scaleparallelpatterningofceramicandorganic-inorganichybridmaterials,”J.Eur.Ceram.Soc.30(
7、7),1555–1577(2010).6.X.C.Shan,R.Maeda,andY.Murakoshi,“Microhotembossingforreplicationofmicrostructures,”Jpn.J.Appl.Phys.42(Part1,No.6B),3859–3862(2003).7.J.Viheriälä,T.Niemi,J.Kontio,T.Rytkonen,andM.Pessa,“Fabricationofsurfacereliefsonfacetsofsinglemodeopticalfibresusingnanoimprint,”E
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