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1、INSTITUTEOFPHYSICSPUBLISHINGNANOTECHNOLOGYNanotechnology16(2005)12851289doi:10.1088/0957-4484/16/8/050Fabricationofcontrollablefree-standingultrathinporousaluminamembranesGQDing,MJZheng,WLXuandWZShen1LaboratoryofCondensedMatterSpectroscopyandOpto-ElectronicPhysics,DepartmentofPhys
2、ics,ShanghaiJiaoTongUniversity,1954HuaShanRoad,Shanghai200030,PeoplesRepublicofChinaE-mail:mjzheng@sjtu.edu.cnandwzshen@sjtu.edu.cnReceived8January2005,infinalform27April2005Published7June2005Onlineatstacks.iop.org/Nano/16/1285AbstractWepresentdetailedinformationonthefabricationoff
3、ree-standingultrathinporousaluminamembranes(PAMs)withcontrollablethicknessof1001000nm.ThemechanismoftheultrathinPAMformationhasbeenrevealedbyacombinationstudyofcurrenttimecharacteristicsandmicrostructureimages.Atthebeginningoftheanodization,V-shapenanoporescanbeobservedduetothealu
4、minaformationinboththesidewallsandthebarrierlayers.Asaresultoftheappliedelectricfieldeffect,partofthealuminainthesidewallsisdissolved,thenanoporesgraduallybecomeregularlyU-shapeandfinallygrowsteadily.UltrathinPAMswithcontrollablethicknessandmorphologyhavebeenrealizedbychangingtheano
5、dizationtimeandthecurrentdensity.Furthermore,animprovedmethodhasbeendemonstratedtoobtainfree-standingultrathinPAMsbyremovingunoxidedaluminiumthroughanontoxicmixturesolutionofsaturatedCuSO4andHCl.1.Introductionofthethickertemplates,thetemplatethicknessgenerallyshouldbelessthan350nm
6、forplasma-enhancedchemicalSelf-organizedporousaluminamembrane(PAM)isahighlyvapourdeposition[14].Therefore,onlyultrathinPAMsorderedtemplate,whichhasnanoporearrayswithinterpore(<1000nm)canbeemployedinthefabricationofnanodotsspacingrangingfrom50to400nm,porediameterfrom20toandnanopore
7、s[29,11,12,1418],andthethicknessshould200nm,membranethicknessfrom0.1to200µm,andporebeasthinaspossibleforthematerialstogothroughthedensityashighas1011porescm−2[1].Thesedimensionsofnanochannelseasily.Nevertheless,duetothehandlingPAMsaresuitableforbothnanometricmaterialsandphotonicdi
8、fficulty,thereportedthinnestfree-s
