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ID:37264513
大小:10.32 MB
页数:58页
时间:2019-05-20
《氢化物气相外延生长GaN的数值模拟》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、氢化物气相外延生长GaN的数值模拟氢化物气相外延生长GaN的数值模拟摘要本文采用有限元分析软件,根据数值模拟原理,对生长GaN用的氢化物气相外延(HVPE)反应室进行了模拟。网格划分采取非结构网格与适应性网格相结合的方式。对衬底高度的改变(即改变源气体出气口到衬底之间的距离)是否影响GaCl和NH3的浓度分布进行了二维与三维的模拟计算,通过对GaCl和NH3摩尔浓度矢量图和XYPlot图的分析,发现衬底高度的改变对GaCl和NH3在衬底表面的分布都有一定的影响,认为衬底高度的改变使得气体输运到衬底表面的距离发生了
2、改变,随着距离的增大,气体向四周扩散或形成涡流。距离控制在10-20mm之间有利于GaCl和NH3在衬底上方的浓度分布。对主载气N2的入口流速是否影响源气体的浓度分布进行了二维与三维的模拟计算,在二维计算中流速的改变对GaCl和NH3在衬底上方的浓度影响不大;在三维模拟中由于NH3管道的位置,发现N2与NH3之间相互影响较大,且认为这和管道的布局有关,在原来的基础上又增加了两个N2管道和一个NH3管道,这样均匀性得到了明显改善。三维模拟中能够实现衬底的旋转,就衬底转速的改变造成的影响进行了模拟计算,发现衬底转速对
3、GaCl和NH3的分布影响不是很大,有利于NH3在衬底上方的均匀扩散,建议采取小转速。利用模拟软件大大节省了实验成本,为制备高质量GaN的最佳生长工艺提供了理论依据,对实际生长有一定的指导作用。关键词:GaN,氢化物气相外延,数值模拟i河北工业大学硕士学位论文CFDSIMULATIONOFGaNGROWNBYHYDRIDEVAPORPHASEEPITAXYABSTRACTThehydridevaporphaseepitaxyofGaNinaverticalflowreactorwasstudiedinthispa
4、perbyfiniteelementmethod,whichbasedonthetheoryofnumericalsimulation.Thegridwasmeshedbytheunstructuredandadaptablegrid.Theinfluenceofthesubstrateheight(theverticaldistancebetweenGaCloutletandthesubstrate)onthedistributionofGaClandNH3concentrationwasstudiedwith
5、two-dimensionandthree-dimensionsimulation.ThemolarconcentrationvectorofGaClandNH3andXYPlotFigureanalysisshowedthatthedistributionsofGaClandNH3concentrationonthesubstrateswereaffectedbytheverticaldistancebetweenGaCloutletandthesubstrate.Itissuggestedthatthethe
6、distanceofthetransportedgastothesurfaceofsubstratechangedwiththesubstrateheight,inducingthegasdiffusionorwhirlpoolwiththeincreaseofdistance.Thedistancebetween10mmto20mmispreferableforthedistributionofGaClandNH3onthesubstratesandtheuniformityofGaNepilayer.Thei
7、nfluenceoftheinletvelocityofmaincarriergasN2wasstudiedwithtwo-dimensionandthree-dimensionsimulation.TheinletvelocityhaslittleinfluenceonGaClandNH3concentrationabovethesubstratebytwo-dimensioncalculation.Butinthethree-dimensioncalculation,itisfoundthattheinflu
8、enceishigherbecauseoftheasymmetricalNH3pipe.AfteraddingoneNH3pipeinthesymmetricalpositionandtwoN2pipes,theuniformityofNH3andGaClisimproved.Three-dimensionalsimulationoftherotatingsubstrat
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