lesson22icprocessingtechnology电子技术专业英语教程

《lesson22icprocessingtechnology电子技术专业英语教程》由会员上传分享，免费在线阅读，更多相关内容在教育资源-天天文库。

1、Unit8IntegratedCircuitsLesson22ICProcessingTechnology《电子技术专业英语教程》冯新宇主编电子工业出版社www.phei.com.cnLesson22ICProcessingTechnologyBackgroundsTexttourLanguageinuseVocabularyStructureReading/writingtechniques10/6/20212《电子技术专业英语教程》Terminologythermaldiffusion热扩散concentrationpeak浓度峰值wetetching湿法刻蚀dryetching干法刻蚀g

2、asflowrate气流率Backgrounds10/6/20213《电子技术专业英语教程》Terminologycrystalgrowth单晶生长Czochralskimethod切克劳斯基法（直拉法）thermaloxidation热氧化integratedcircuit集成电路ionimplantation离子注入electricfield电场Backgrounds10/6/20214《电子技术专业英语教程》TexttourOutlineIntroduction(para.1)Crystalgrowth(para.2、3)Oxidation(para.4、5)Diffusionandio

3、nimplantation(para.6-9)Lithographies(para.10-13)Etching(para.14-17)10/6/20215《电子技术专业英语教程》IntroductionTheprocessstepsdescribedhereinclude…10/6/20216《电子技术专业英语教程》CrystalgrowthTheCzochralskiprocessCzochralskimethod10/6/20217《电子技术专业英语教程》OxidationOxidationistheprocessbywhichalayerofsilicondioxide(SiO2)isf

4、ormedonthesurfaceofthesiliconwafer.10/6/20218《电子技术专业英语教程》DiffusionandionimplantationDiffusionandionimplantationarethetwokeyprocessesweusetointroducecontrolledamountsofdopantintosemiconductor.AnionimplantationsystematLAAS10/6/20219《电子技术专业英语教程》LithographiesThereareseverallithographicmethodstoimplement

5、…Theprocessofthelithographies10/6/202110《电子技术专业英语教程》EtchingEtchingistheprocessofremovingexposed(unprotected)material…10/6/202111《电子技术专业英语教程》Vocabularydiffusion,immerse,velocity,penetrationhazardStructureReading/writingtechniquesLanguageinuse10/6/202112《电子技术专业英语教程》Vocabulary10/6/202113《电子技术专业英语教程》Dff

6、usionindictionaryTheprocessofdiffusingortheconditionofbeingdiffused.扩散：扩散的过程或扩散的条件Needlessprofusionofwords;prolixity.冗长：没完没了有好多话；冗长而罗嗦Physics【物理学】Thescatteringofincidentlightbyreflectionfromaroughsurface.反射：偶然的光线在粗糙表面的反射10/6/202114《电子技术专业英语教程》DffusionintextDiffusionandionimplantationarethetwokeyproc

7、essesweusetointroducecontrolledamountsofdopantintosemiconductor.扩散和离子注入是控制半导体材料掺杂量的两种主要工艺。Bothdiffusionandionimplantationareusedfabricatingdiscretedevicesandintegratedcircuit..扩散和离子注入常被用来制造分立器件和集成电路。1