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1、------------------------------------------------------------------------------------------------激光能量对脉冲激光沉积法制备ZnO薄膜性能的影响_贾芳第32卷第4期2009年8月电子器件ChineseJournalOfElectronDevicesVol.32No.4Aug.2009EffectofLaserEnergyonthePropertiesofZnOFilms*byPulsedLaserDepositionMeth
2、odJIAFang1,2,CAOPeijiang1,2,ZENGYuxiang1,211DepartmentofMaterialScienceandEngineering,ShenzhenUniversity,Shenzhen,Guangdong518060,China21ShenzhenKeyLaboratoryofSpecialFunctionalMaterials,ShenzhenUniversity,ShenzhenGuangdong518060,China———————————————————————————
3、———————————------------------------------------------------------------------------------------------------Abstract:PulsedlaserdepositionmethodbecameahotpointinallkindsofpreparingZnOfilmsmethodsonaccountoftendingtogettingoxidefilmsofhighquality.WithhighpureZnasa
4、target,ZnOfilmsonsinglecrystalsilicon(Si)andquartzwafershavebeenfabricatedbypulsedlaserdepositionmethod(PLD)(KrFexcimerlaser:wavelength248nm,pulsefrequency5Hz,pulseduration20ns)atO2atmosphere.Thecrys-talstructures,thicknessesandopticalpropertiesofZnOfilmshavebee
5、nstudiedbyX-rayDiffraction,Sru-faceProfile,PhotoluminescenceSpectraandUltraviolet-VisibleSpectrophotometry,andthecharacterizationinflectionofZnOfilmsbylaserenergyhasbeengiven.ItisobviousthatthecrystalstructuresofZnOfilmswepreparedwas(002)highstructuralperfection
6、andthetransmittanceofoursampleswasmorethan75%.Luminescencecapabilitywasbetterthanotherswhenlaserenergywas450mJ,butitcouldnptim-proveluminescencecapabilityofZnOfilmsbyenhancinglaserenergy.Keywords:ZnOfilms;laserenergy;PLDEEACC:0520激光能量对脉冲激光沉积法制备ZnO薄膜性能的影响*贾芳,曹培江,
7、曾玉祥11深圳大学材料学院,深圳51806021深圳市特种功能材料重点实验室,深圳5180601,21,21,2摘要:脉冲激光沉积技术(PLD)易于获得高质量的氧化物薄膜已成为一种重要的制备ZnO薄膜的技术。采用脉冲激光沉积(PLD)(KrF准分子激光器:波长248nm,频率5Hz,脉冲宽度20ns)方法在氧气气氛中以高纯Zn(991999%)为靶材、在单晶硅和石英衬底表面成功生长了ZnO薄膜。通过X射线衍射仪、表面轮廓仪、荧光光谱仪、紫外可见分光光度计对合成薄膜材料的晶体结构、厚度、光学性质等进行了研究,分析了激光能
8、量变化对其性能的影响。实验结果表明我们使用PLD法可以制备出(002)结晶取向和透过率高于75%的ZnO薄膜,激光能量为450mJ的ZnO薄膜的发射性能较好,但激光能量的增加不能改善薄膜的透光率。关键词:ZnO薄膜;激光能量;脉冲激光沉积——————————————————————————————————————---------
