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1、上海交通大学硕士学位论文AbstractCRYSTALLIZATIONANDTEXTURECHARACTERISTICSOFCOBALT-SILICONTHINFILMSPUTTEREDBYALLOYTARGETABSTRACTThetargetmaterialsofCoSi2alloywasdesignedandprepared,andthefilmsystemwasdepositedbyusingthemagnetronsputteringmethod.Testingresultsshownt
2、hat,theelementsdistributehomogeneouslyinfilm,andsimilartothetargetmaterials.ThecrystallizationandphasetransformationofamorphousCoSi2thinfilmswereinvestigatedbyinsituX-raydiffraction,differentialscanningcalorimeter,EDXAandScanningElectronMicroscope.The
3、resultshownthatthesputteredCoSi2filmswereamorphousfilm,CoSiphaseformedfirstly,astemperatureincreasingthefilmchangetobeCoSi2finally.ThroughcalculationwegotGibbsfreeenergy-compositioncurve,fromwhichwecanfindoutthechangeofGibbsfreeenergyaccordingtodiffer
4、entfilmcomposition.Usethecommontangentlineprinciple,thecurvewasdividedintothreeregions,TheGibbsfreeenergy-compositioncurvesupportthatamorphousphasehadlowerGibbsfreeenergyatCoSi2.Crystallizationtemperatureofcobaltandsiliconalloyfilmatdifferentcompositi
5、onwasstudied,therearemainlythreedifferentmechanismsatdifferentcomposition:theyareMIC,minusenthalpyanddiffusion.Fromthesecalculationsandanalyses,wegaveoutcleardepictionofcrystallization.Thefilm’stexturecharacterwasstudied,asimpleexpressionmethodofthewi
6、retexturewasestablished,andthefilmtexturewasmeasuredquantitatively.ThroughthedeductionoftheimprovedKnuyt’smodelandtheeffectsofthesizeoftheoriginalgrain,wesuccessfullyexplainedwhythe(111)texturegrowwithaprivilege;explainedtheeffectsofthesputteringparam
7、etersontexture:sputteringpowerandpressurewereinlinearrelationshipwiththe(111)texture,Ifthesputteringpowerraise,theII上海交通大学硕士学位论文Abstract(111)textureofcrystalfilmincreased;withthepressurereducing,thefilmtextureincreased;Withthesubstratetemperaturerisin
8、g,thefilmtextureincreasedatinitial,uptothemaximumthendecreased.Keywords:Magnetronsputtering,silicide,film,crystallization,textureIII上海交通大学学位论文原创性声明本人郑重声明所呈交的学位论文是本人在导师的指导下独立进行研究工作所取得的成果除文中已经注明引用的内容外本论文不包含任何其他个人或集体已经发表或撰写过的作品成果对本文的研究做出重要贡献的个人和集
