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1、JournalofAppliedElectrochemistry30:429±437,2000.429Ó2000KluwerAcademicPublishers.PrintedintheNetherlands.ElectrochemicalinvestigationofthecodepositionofSiCandSiO2particleswithnickel112334P.NOWAK*,R.P.SOCHA,M.KAISHEVA,J.FRANSAER,J.-P.CELISandZ.STOINOV1PolishAcademyofSciences,InstituteofCatalysis
2、andSurfaceChemistry,ul.Niezapominajek1,30239KrakoÂw,Poland;2UniversityofSo®a,FacultyofChemistry,DepartmentofPhysicalChemistry,1,J.BourchierBul.,1126So®a,Bulgaria;3DepartmentofMetallurgyandMaterialsEngineering,KatholiekeUniversiteitLeuven,B-3001Heverlee,Belgium;4BulgarianAcademyofSciences,Centra
3、lLaboratoryofElectricPowerSources,So®a1126,Bulgaria(*authorforcorrespondence)Received28April1999;acceptedinrevisedform2September1999Keywords:compositecoatings,electrochemicalimpedancespectroscopy,nickelelectrodeposition,particlecodepo-sition,siliconcarbideAbstractTheuseofelectrochemicalimpedanc
4、espectroscopy(EIS)fortheinsitucontroloftheelectrolyticcodepositionofNi/SiO2andNi/SiCwasinvestigated.Anattemptwasmadetoclarifywhysilicaparticleshardlycodepositincomparisontosiliconcarbideparticles.ItwasfoundthatthepresenceofSiO2andSiCparticlesin¯uencesthemetaldepositionprocessindierentways.SiCpa
5、rticlesthatarebeingembeddedinthegrowingmetallayercauseanapparentdecreaseintheelectrodesurfacearea,probablyduetoblockingoapartofthesurfacebypartlyengulfedparticles.InthecaseofSiO2particles,whichembedinthemetalmatrixtoaverylimitedextent,noblockingwasobserved.Itwasfoundthatthepresenceofparticlesin
6、thesolutioncausesanapparentincreaseintheelectrodesurfacearea,probablyduetoincreasedsurfaceroughness.1.Introductioncodepositionforsystemsofde®nedhydrodynamics(e.g.,rotatingdiscelectrode).AnattempttodevelopaSolidparticlessuspendedinaplatingbathcanadheretopredictivemodelwasundertakenbyFransaeretal
7、.[22].thecathodeduringelectrolysisand,undercertainThenumberofparticlesreachingthesurfaceofaconditions,beembeddedinthegrowingmetallayer.rotatingdiscelectrodewascalculatedusingatrajectoryThisphenomenoncanleadtothecontaminationofthea
