不同黏结材料与金属全冠黏结界面的实验分析

不同黏结材料与金属全冠黏结界面的实验分析

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时间:2019-03-01

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1、TheExperimentevaluationofinterfacebetweendifferentlutingcementsandcastingmetalfullcrownMasterdegreecandidate:LiuXUSupervisor:ProfessorLiZhenchunMajor:prostheticdentistryAbstraetobjiective:Usedscanningelectronmicroscope(SEM)toobservedinterf.acebetweenlutingcements

2、andconformationofthedentinlayerelements,analysisandcomparisonofallkindsofthelutingandthecombiningmodeofdentinlayer,whichprovidethetheorybasistochoosethedifferentlmingcementsintheclinical.Materialandmethods:Thisexperimentchose8molarteethwhichwererecentpulledoutof,

3、crownmorphologycompletefromthebody.Thesemolarteethwouldbeembeddedfromenamelo—cementaljunctioninplastermould,andthentoregulartoothpreparation,andmadetheseexperimenttoothkeepcontoursandheightrelativelyconsistent.Aftertakingimpressionmold,perfusiongypsummodel,thecas

4、tingmetalfullcrownwasmadebylosingwax.Use8kindsoflutingcementsforcementedandaccordingtotheordernumbersbehindt11e如Ucrownsweretry.MadetheExperimentspecimenin23+I。C,andthenstoredintheenvironmentwhichmajntained100%relativehumidity,and30dayslaterwewouldseparatededperim

5、entspecimenwiththeplastermould,embeddedinepoxyresins.Cuttingspecimenwithslowsawteethalongthedirectionofperpendiculartotheteethlongaxis,thegrindingandpolishing,ultrasoniccleaning,thespecimenexaminedunderscanmngelectronmicroscope(SEM)andelectronmicroprobeanalyzer(E

6、PMA)withelectronbeamoflgmindiameter,observedbondandlinearanalysisandelementalanalysisbyelectronmicroscopyin500,2000times.Metalfullcrown,thedentin,lutingcementsandlutinginterfacepointscanning,linescanningofthespecimenunder100timesmagnification.Themainelementsofthe

7、selectedadhesivematerialbyobservingthedataanalysisofthelutinginterfaceelementswithin50pmexchangetransfer.Results:1Al、Si、P、F、K、FaredetectedintheGCFujiPlus;A1、Si、C、0、Caaredetectedinthelutinginterfaceintherangeof509rn.2Al、Si、P、S、KaredetectedintheGCFujiI:A1、P、C、Caare

8、detectedinthelutinginterfaceintherangeof50IJxn.3A1、Si、P、K、CaaredetectedintheShofuGlasionomer;Mg、Si、C、O、Caaredetectedinthelutinginterfaceintherangeof509m.4A1、Si

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