低温等离子体联合表面酸化tio2催化剂降解油漆废气的分析-(5465)

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1、万方数据AbstractEmissionofvolatileorganiccompounds(VOCs)fromindustrialandautomobilesourceshascausedseriousenvironmentalproblems，sinceitcontributessignificantlytotheformationofphotochemicalsmogandsecondaryaerosolintheurbanareas．Asaresult,researchontheabatementof

2、VOCshasbeenattractingincreasinglypublicattention．Althoughtraditionalmethodssuchasadsorption，thermaloxidation，andcatalyticcombustionhavebeenadoptedtoremoveVOCsfromexhaustgases，thesetechniquesoftenencountere伍cientandeconomicalproblemswhenn。eatingtheexhaustgas

3、withaconcentrationofVOCsbelow100ppm．Moreover,theglobalCO，selectivityalsoneedstobefurtherimproved．especiallyforindustrialapplications．Apromisingapproachtotacklethismatteristocombinenon·thermalplasmas(NTP)withcatalysts．NTPgeneratedatatmosphericpressureandroom

4、temperatureisconsideredtobeenergye伍cientbecauseoffastignitionresponseandgenerationofhighlyenergeticradicalswhichcontributetoplasmachemistryreactions．Ontheotherhand，asynergyeffectispossibletoovercomethelowselectivityproblemthroughsuitablecatalystsintegration

5、withplasmas．Inthiswork，asurfaceacidificationmethodwasemployedtomodi句theTi02catalystfortheenhancementofitssurfaceactivity,whichwastestedbydegradinggaseousxyleneinadielectricbarrierdischarges(DBD)reactorwithaspiralhigh．voltageelectrodeinside．Themainresearchco

6、nclusionsareasfollows：(11BothLewisandBronstedacidsitesonthesurfaceofthecatalysthadbeenincreased．Lewisacidityincreasingfrom0．018to0．045mmol／gandBronstedacidityfrom0．002toO．015mmol／g，whichprobablyledtotheactivitypromotionofTi02catalystinthedegradationprocess，

7、sinceBronstedsitesdestroyedthestableconstructionofxyleneandLewissitesfacilitatedtheozonedecompositionreaction．Atthepeakvoltageof14kVandspecificinputenergy(SIE)of828J／L，xyleneconversionratiosachievedbytheuntreatedandacidizedTi02catalystswere86．00％and92．48％：t

8、heCOxselectivitywere95．16％and98．53％．FTIRresultsshowthatformicacid(HCOOH)wasformedasabyproductfromxylene，withoutanyotherring—retainingproductsbeingobservedcomparedwitllthephotocatalyticprocess．(2)SIEand