透明栅algan2fgan+hemt器件制备与特性分析

透明栅algan2fgan+hemt器件制备与特性分析

ID:32215547

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页数:48页

时间:2019-02-01

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3、a_N/GaNHEMTdeViceswithtransparentgatematerialsofAZO(Al-dopedZincOxide)werestudied.Firstly,theAlGaN/GaNStructureandtheoperationmechanismofHEMTdeVic骼wereinVestigated.Basedonthetheo呵,AlG扑ⅣGa_NHEMTdeviceswithtransparentAZOgatewerefabricatedsuccess如lly,andtheirpropertiesincludingDCc

4、haracter.sticsandSchottkycharacteriSticswere锄aIysed.DepositingathinNi(10nm)layerbeforetheAZOcouldeffectiVelyreducethegateleakagecurrentandimproVetheSchottkybarrierhei曲t.Besides,itgaVeriset0ahi曲ersa_turationcu九.ent.TIlleinfluenceof豫pidthermala11neaIing(RTA),UVi11radiation锄delect

5、ricalStressinthedevicesw弱aIsoinvestigatedinthisdisseIrtation.TheresultsshowedthatannealingatlowtempemtIlre,especially300℃,wouldsignificantlyimproVetheSch嘣kych棚.acteristics.Butseriousdegrada“onofthedevicVeswouldoccurduringannealingat400℃.UVimdiationcouldincreasetheoutputcurrent,

6、asareSultofmereleaseofeIectronscapturedbytrapsinthedevicesandthegeneratiollofphoto-inducedcarriers.W11at’simportantisthatthedeVicescharacteristicscouldnotrecoVercompletelyaRertheremovalofUVlight.Undertheon—stateStress,thehotelectronsinchannelwerecapturedbytrapsinthebarrierorbuf

7、俺rlayer,whichdepletedthetwo-dimensionalelectrongas(2DEG)andincreasedtheconductionresistance.Thisdegradationreducedthesaturationcullrentandpeaktransconductance.However'undertheoff-stateStress,thesaturationcullrentandtransconductanceincreased,andthethresholdVoltagenegatiVelydriRe

8、dsimultaneously.Thiswasduet0theinjectionofsomeelectron

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