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1、国产晶硅平板pecvd设备的优势PdfdocumentsmayexperiencepoorbrowsingontheWAPside・ItisrecommendedthatyouselectTXTfirstordownloadthesourcefiletothelocalmachine・AdvantagesofdomesticcrystallinesiliconflatpanelPECVDequipmentDr.WangBaoquanMay2010SNECBoothlocation:W2Pavil
2、ionT2136TechnicaladvantagesofcrystallinesiliconflatpanelPECVDdevices,opportunitiesfordevelopingPECVDdevicesinNorthmicroelectronics,competitiveadvantagesofESSINDTMPECVDdevicesConfidentialTechnicaladvantagesofcrystallinesiliconflatpanelPECVDdevices,opp
3、ortunitiesfordevelopingPECVDdevicesinNorthmicroelectronics,competitiveadvantagesofESSINDTMPECVDdevicesConfidentialApplicationofPECVDdeviceincrystallinesiliconsolarcellprocessPECVD(plasmaenhancedchemicalvapordeposiLion)isusedtocontrolorinfluencethepla
4、smacharacteristicsofgasphasereactionsandsurfacechemicalreactionprocess,andattheappropriatetemperature(fromroomtemperatureto500DEGC)underthinfilmdeposition.FabricationprocessofcrystallinesiliconsolarcellsPrintingandetchingdiffusionofPECVDsinteredelect
5、rodepreparedbypretreatmentandtexturingPECVDdeviceforpreparingSiNxfilmPreparationofSiNantireflectivepropertiesbypassivationcharacteristicsConfidentialShortcircuitcurrent,batteryefficiency,opencircuitvoltagePECVDdeviceclassesThestructureofequipmentisdi
6、videdFlattubetypeDivisionofdepositionprincipleDirectindirectmethodPlasmaSourceSiH4,NH3PlanarcarrierplateHollowedoutcarbonframeGraphiteboatPlanarcarrierplateGraphiteboatThefunctionisdistributedindifferentchambers,thegasutilizationrateishigh,theautomat
7、iondegreeishigh,theproductionefficiencyishigh,theautomaticloadingandunloadingtabletiseasytorealizetheequipmentmaintenancetediousThefunctionisconcentratedinthesamefurnacetube,thegasutilizationrateislow,thedegreeofautomationislow,theproductionefficienc
8、yislow,theautomaticloadingandunloadingsheetisnoteasytorealize,andtheequipmentmaintenanceissimpleThepassivationrateofpassivationfilmondensesurfaceislowThedepositionrateofpassivationfilmishighFlatplatedirectmethodPECVDcanmeettheneedsofIndustrialDevelop