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ID:54371324
大小:1.02 MB
页数:7页
时间:2020-04-30
《Mo含量对TiMoN薄膜微观组织和摩擦磨损性能的影响.pdf》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、第48卷第9期舍属学坂、1.48NO.92012年9月第1132-1138页ACTAMETALLURGICASINICASept.2012PP.1132—1138Mo含量对TiMoN薄膜微观组织和摩擦磨损性能的影响许俊华鞠洪博喻利花(江苏科技大学先进焊接技术江苏省重点实验室,镇江212003)摘要采用射频磁控溅射制备不同Mo含量的TiMoN薄膜.利用XRD,SEM,EDS,纳米压痕仪和高温摩擦磨损实验对薄膜的相结构,形貌,成分,力学性能和摩擦磨损性能进行分析.结果表明,TiMoN薄膜为fcc结构;当Mo占金属元素总量的比例X<68.37%(原子分数)时,薄膜主要为Mo在TiN中的置换固溶体
2、;当X>68.37%时,薄膜主要为Ti在M02N中的置换固溶体;随Mo含量的增高,择优取向发生改变,晶粒尺寸逐渐减小,薄膜的显微硬度显著升高,最高达36.37GPa,摩擦系数逐渐降低,并在x达到68.37%后稳定在0.4左右;不同Mo含量的TiMoN薄膜的磨损率在lO一一10一mm/i之间,优于TiN薄膜.基于晶体化学理论,对TiMoN薄膜低摩擦系数的原因进行了讨论.关键词射频磁控溅射,TiMoN薄膜,微观组织,摩擦磨损中图法分类号TG174.444文献标识码A文章编号0412—1961(2012)09—1132-07EFFECTSoFMoC0NTENToNTHEMICR0STRUCTUR
3、EANDFRICTIoNANDWEARPRoPERTIES0FTiMoNFILMSxUJunhua.JUHongbo.YULihuaKeyLaboratoryofAdvancedWeldingTechnologyofJiangsuProvince,JiangsuUniversityofScienceandTechnologyZhenjiang212003Correspondent:Junhua.professor,2(0511)84411035。E—mail:jhxu@just.edu.c佗SupportedbyN8tionalN8turalScienceFoundationo/China
4、(No.51o74o8o)andN8tureScienceFoundationo.fJiangsuProvince(No.BK2008240)Manuscriptreceived201i-12—03,inrevisedform2012—05—25ABSTRACTOverthepastyears.hardwearresistantTiNcoatingsdepositedbymagnetronsputteringhaveRainedincreasingimportanceinthefieldofdecorativeandcuttingtoolcoatings.Withtheongoingtre
5、ndtomultifunctionaloperatingcuttingtools,newsolutionsinthedesignoftoolsaredemanded.ThealloyingofTiNcoatingswithadditionalelementsforinstance.caneffectivelyenhancehardness.wearresistanceandSOon.BothTiAlNandTiSiNcoatings.wel1studiednitridesystemsyieldsuperioroxidationresistance,andextendtheIifeofcut
6、tingtoolsbysignificantmarginsincomparisonwithTiNcoatings.NumerousresearchactivitiesfoCUSonTiA1N.TiSiNsystems.whereaslimitedefortshavebeenmadetocharacterizeTiMoNcoatings.Lowape伍cientoffrictionisacommonpropertyinvariousMo——containingcoatingsthatcanreactwithoxygenintheairintoMagn6liphase(MOO3).Theefe
7、ctsofMOalloyingonmechanicalpropertiesandwearresistanceofTiN-basedcoatingsremaintobeinvestigated.TiMONcompositefilmswithvariousM0concentrationsweredepositedusingRFreactivemagnetronsputteringandcharacterizedbySEM.E
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