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时间:2020-03-28
《氢气对脉冲磁控溅射掺铝氧化锌薄膜性能地影响.pdf》由会员上传分享,免费在线阅读,更多相关内容在教育资源-天天文库。
1、第二部分硅基薄膜太阳电池·561·氢气对脉冲磁控溅射掺铝氧化锌薄膜性能的影响李林娜陈新亮+张德坤张晓丹赵颖(南开大学光电子薄膜器件与技术研究所&南开大学光电子薄膜器件与技术天津市重点实验室&南开大学光电信息技术科学教育部重点实验室,天津300071)摘要采用脉冲磁控溅射法制备铝掺杂氧化锌(AZ())薄膜,通常在纯氩气环境中制备的AZ0薄膜透过率较低。以AZO透明导电薄膜作为硅基薄膜太阳电池的前电池,较低的透过率将严重影响电池的光电转换效率,这对AZ0薄膜是十分不利的。为了提高AZ0薄膜的透过率,我们在溅射过程中加入一定流量的氢气,以高纯ZnO:A12@陶瓷靶为溅射靶材,制备AZ0透
2、明导电薄膜。通过测试薄膜的结构特性、表面形貌及其光电性能,详细地研究了氢气流量对AZO薄膜性能的影响。溅射过程中引入氢气,可以促进薄膜的晶化,提高薄膜的迁移率和透过率(400~1100nm)。采用纯氩气溅射制备AZ0薄膜的电阻率为5.664×10—4Q·cm,加入氢气后薄膜的电阻率降低至4.435×10_4Q·cm。在Raman测试结果中,可以观察到表征氧空位缺陷的Raman峰(579crll.1)强度随氢气流量的增大而减小。与AZ0薄膜相比,在氢气气氛中溅射制备的Az0/H薄膜,腐蚀后更容易获得具有陷光效应的“弹坑”状表面形貌。关键词氧化锌;氢气流量;磁控溅射;太阳电池Effec
3、tsofHydrogenFluxontheAluminumDopedZincThinFilmsbyPulseMagnetronSputteringLiLinnaChenXinliang’ZhangDekunZhangXiaodanZhaoYing(Instituteofphoto-electronicthinfilmdevicesandtechniqueofNankaiUniversity&KeyLaboratoryofphotoelectronicsthinfilmdevicesandtechniqueofTianjin&KeyLaboratoryofOptoelectronic
4、InformationScienceandTechnology,ChineseMinistryofEducation,Tianjin,300071.China)AbstractAluminumdopedzincoxide(AZO)thinfilmswerepreparedbypulsemagnetronsputteringwithpureargongas.usuallyshowedrelativelylowtransmissioninourexperiments.ItWasunfavorableforAZOasfrontelectrodeforsiliconthinfilmsola
5、rcells.InordertoincreasethetransmissionofAZOthinfilms。wetriedtoaddhydrogengasintovacuumduringsputteringprocesses.Highpurityceramiczno:砧203tar-getandvariousflowrateofhydrogengaswereusedassourcematerials.Themicrostructure·surfaceinfor-mation。opticalandelectricalpropertiesofAZO/Hfilmswereinvestig
6、ated.Thecrystallization,HaUmobil-ityandtransmissionbetween400ntnand1100nmwereenhancedbyincreasingofl-hflowrate,andresis-tivityWasdecreased。thelowestresistivityofthesefilmswere4.435×10—4Q·cm,andweachievedAZOthinfilmswith5.664×10—4Q·cm.Inthisexperience,itwasobservedRamanpeakrelatedtodefectsdueto
7、O-vacancies(579cm。1)intheAZO/HthinfilmsgrownwithdifferentHzflowrates.Withincreasingofhydrogenflowrate,theintensityofRamanpeakat579cm—decreased.Finally,AZOandAZO/Hthinfilmswereetchedin0.5%dilutehydrochloricacid.ComparedwithAZOthinfilms,A
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