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ID:52398185
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时间:2020-03-27
《SOI纳米波导的优化制备与弯曲损耗测试.pdf》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、第25卷第11期传感技术学报Vo1.25No.1l2012年11月CHINESEJOURNALOFSENSORSANDACTUATORSNOV.2012OptimizationsFabricationandTestofBendingLossoftheSO1Nano-WaveguideZANGJunbin,XUEChenyang,WEILiping,WANGJingxue,CUIDanfeng,WANGYonghua,TONGXiaogang(1.KLaboratoryD厂InstrumentationScience&DynamicMeasurement(Nor
2、thUniversityofChina),Min~tryofEducation,Taiyuan030051,China2.ScienceandTechnologyonElectronicTest&MeasurementLaboratory(NoAhUniversityofChina),Taiyuan030051,China)Abstract:ThepapermainlyaimedataseriousbendinglossproblemofSOInano—waveguidestructure,conductedatheoretica1simulationanal
3、ysissystematically,schemedoutthebestnano.waveguidestructure,andmadeuseoftheMEMStechnologyonthefabricationandprocessingofoptimization.Thenthisworkmadeaprecisetestingoftheroughnessofwaveguidesidewallandthecorrespondingbendinglossafterannealingtreatmentofthermaloxidationofdifferenttemp
4、erature,underthesamecircumstancesofhigh—puritynitrogenannealingandBOEcorrosionpost·processing,bythemeansoftheSEM(scanningelectronmicroscope),AFM(atomicforcemicroscope)andtransmissionspectrumpowermethod.Itturnedoutthatthesidewallroughnessofthewaveguidechangesalongwiththeannealingtemp
5、eratureinaquadraticapproximationparabolictrendandreachesthelowestvalue2.1nmaround90Oqcwherethecorrespondingradiusis15mandthecircularwaveguidebendinglossis(O.0109+0.0010)dB/turn,whichshowslossvalueandthetheoreticalanalysisresultsareconsistent.Torealizeeficienttransmissionoflightenerg
6、y,wecanchoosedifferentoptimizationdisposalconditionstoreducethecircularwaveguidebendinglossbytakingadvantageofthisconclusion.Keywords:silicon—on—insulator;nanophotonicwaveguide;MEMS;roughness;bendlossEEACC:7230doi:10.3969/j.issn.1004—1699.2012.011.006SOI纳米波导的优化制备与弯曲损耗测试臧俊斌,薛晨阳,韦丽萍,王
7、景雪,崔丹凤,王永华,仝晓刚(1.中北大学仪器科学与动态测试教育部重点实验室,太原030051;2.中北大学电子测试技术国家重点实验室,太原030051)摘要:主要针对目前SOI(Silicon.on—insulator)纳米光波导结构弯曲损耗严重的问题,系统地进行了理论仿真分析,设计}}J最佳的纳米波导结构,并采用MEMS:艺对其进行加制备与优化处理。后利用了SEM(扫描电子显微镜)、AFM(原子力显微镜)、透射谱功率法等研究手段精确测试了在高纯氮退火和BOE腐蚀后处理不变的情况下,不同温度热氧化退火处理下的波导侧壁粗糙度和对应的弯曲损耗,结果表明:波导的侧
8、壁粗糙度随退火温度的变化近似呈二次抛物
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