ESI离子源背景离子来源

《ESI离子源背景离子来源》由会员上传分享，免费在线阅读，更多相关内容在教育资源-天天文库。

1、ESI离子源背景离子来源m/zIonCompoundSourceofUnknown33(M+H)+methanol42(M+H)+acetonitrile59(M+NH4)+acetonitrile64(M+Na)+acetonitrile65(2M+H)+methanol74(M+H)+dimethylformamide79(M+H)+DMSO83(2M+H)+Acetonitrile85(M+H)+d6‐DMSO88(M+FormicAcid+H)+acetonitrile101(M+Na)+DMSO102(M+H)+triethylamine(TEA)

2、104/106(M+Cu)+acetonitrile105(2M+Na)+acetonitrile115(M+dimethylformamide+H)+acetonitrile120(M+Na+CH3CN)+DMSO122(M+H)+tris,tris(hydroxymethyl)aminomethane123(M+H)+dimethylaminopyridine(DMAP)130(M+H)+diisopropylethylamine(DIPEA)137(M+CH3CN+NH4)+DMSO144(M+H)+tripropylamine(TPA)145/147

3、(2M+Cu)+acetonitrile146(3M+Na)+acetonitrile149(M+H)+phthalicanhydride150(M+H)+phenyldiethylamine153(M+H)+1,8‐diazabicycloundec‐7‐ene(DBU)157(2M+H)+DMSO159(M+Na)+sodiumtrifluoroacetate163dimethylphthalate167dioctylphthalate169(2M+H)+d6‐DMSO171(M+Na)+phthalicanhydride179(2M+Na)+DMSO1

4、86(M+H)+tributylamine195(M+H)+dimethylphthalate214(M+H)+n‐butylbenzenesulfonamide(plastisizer)225(M+H)+dicyclohexylurea(DCU)231(M+NH3)+n‐butylbenzenesulfonamide(plastisizer)236(M+Na)+n‐butylbenzenesulfonamide(plastisizer)239/241+triethylamine242M+tetrabutylammonium(C4H9)4N+243M+tri

5、tylcation257(3M+H)+DMSO267(M+H)+tributylphosphate273M+monomethoxytritylcation(MMT)279M+triphenylphosphineoxide279M+dibutylphthalate(plasticiser)282(M+H)+oleamideslipagentinpolyethylenefilms284(M+H)+stearamideslipagentinpolyethylenefilms288(M+H)+n,n‐bis(2‐hydroxyethyl)dodecanamidean

6、ti‐staticagent301(M+Na)+dibutylphthalate(plasticiser)303(M+Na)+oleamideslipagentinpolyethylenefilms317(M+K)+dibutylphthalate(plasticiser)336(M+H)+tributyltinformate338(M+H)+erucamideslipagentinpolyethylenefilms355siloxanefromsilicacolumn360(M+Na)+erucamideslipagentinpolyethylenefil

7、ms371(M+H)+decamethylcyclopentasiloxane388decamethylcyclopentasiloxane391(M+H)+diisooctylphthalate(plasticiser)413(M+Na)+diisooctylphthalate(plasticiser)425(M+Na)+unidentifiedcontaminant(plasticiser)429(M+K)+diisooctylphthalate(plasticiser)seenw/silicacapillaryNanoSprayer445(M+H)+d

8、odecamethylcyclohexasiloxa