SEMI P6-88 SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS

SEMI P6-88 SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS

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1、SEMIP6-88N/A©SEMI1988,1996SPECIFICATIONFORREGISTRATIONMARKSFORPHOTOMASKS1GeneralSpeciÞcation3.5Thewidthandlengthofthehorizontalandverti-callinesmayvaryduetodesignrules,scaling,process1.1Scopebias,etc.Table1liststhedesigndimensionsforeach1.1.1ThisspeciÞcationdeÞnest

2、heshape,rangeoftypeofphotomask.Sections3.3and3.4arenotsuper-sizes,andgeneralplacementofaregistrationmarkforcededbythisstatement.useonallphotomasks.Methodsofusewillbestatedin3.6Anyofthefourquadrantscreatedtotheoutsideaccompanyingapplicationnotes(tobefurnishedataofth

3、ecrossshallbedeÞnedas"No-Man'sLand"andlaterdate).shallnothaveanygeometryormarksplacedwithin1.2ApplicableDocumentsÑNone.them(seeFigure3).3.7Fieldorregistrationmark,i.e.,darkorclear,is2DetailSpeciÞcationsuserdeÞnable.2.1Introduction3.8Themarkshallbeplacedasperattache

4、dapplica-2.1.1ThecompletespeciÞcationforthisregistrationtionnotes(tobefurnishedatalaterdate).markistobeagreeduponbythecircuitdesigner,maskmaker,andthemaskuser.2.2Requirement2.2.1ThisspeciÞcationcoversadeÞnedmarkplacedphotolithographicallyonphotomasksfortheexpresspu

5、rposeofdeterminingtheregistrationaccuracyofoneimagedphotomasktoanotherimagedphotomaskwithinthesamesetofphotomasks.2.3Other2.3.1Thismarkisnotintendedtobeusedforthedeterminationofoverlayaccuracyofanimagedlayerofaphotomaskontoamakertoanysubsequentimagedlayersonthesame

6、wafer.3GuidelinesforShapeandSizesofRegistrationMark3.1Theshapeofthemarkshallbeintheformofacross(seeFigure1).3.2Theareaofintersectionofthehorizontalandver-ticallinesshallbe"user-deÞned".Thedesigner,maskmakerorusermaydeÞneanyshapeofgeometrywithinthisarea.The"user-deÞ

7、ned"geometryusedshallnotexceedthewidthorheightoftheareaofintersection(seeFigure2).3.3Thewidthofboththehorizontalandverticallinesshallbeequal.3.4Thelengthofboththehorizontalandverticallinesshallbeequal.1SEMIP6-88©SEMI1988,1996Table1.DimensionsofRegistrationMarkForAl

8、lMaskTypes(alldimensionsareinmicrometers(µm))TypeofPhotomaskWidthLengthUserDeÞnedAreaTotalPatternWindow1´Masters4-810-15min.4´4min.24´24max.8´8ma

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