SEMI M12-0998E SPECIFICATION FOR SERIAL ALPHANUMERIC MARKING

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1、ESEMIM12-0998SPECIFICATIONFORSERIALALPHANUMERICMARKINGOFTHEFRONTSURFACEOFWAFERSThisspecificationwastechnicallyapprovedbytheGlobalSiliconWaferCommitteeandisthedirectresponsibilityoftheNorthAmericanSiliconWaferCommittee.CurrenteditionapprovedbytheNorthAmericanSiliconWaferCommitteeonJuly12,1998.Initi

2、allyavailableonSEMIOnLineMay1999;tobepublishedJune1999.Originallypublishedin1988.EThisdocumentwasmodifiedbytheGlobalTraceabilityCommitteeinApril1999toreflectthecreationofSEMIAUX1asthesourceforvendoridentificationcodes.Changesweremadetonumeroussections.withinwhichallcharactersmustbecontainedasshown

3、1ScopeonFigures3and4withdimensionsof18.5mmlong1.1Thisspecificationdefinesthegeometricandspa-and2.8mmhighaslocatedonthesefigures.tiallimitsofthealphanumericcode,specificallyfor3.5frontsurfaceofthewafer—theexposedsurfaceserialidentificationofflattedandnotchedsiliconwa-uponwhichactivesemiconductordev

4、iceshavebeenorfers.Italsodefinesthebasiccodeusedtocharacterizewillbefabricated.theindividualwafer,usingdatabasesystems.Thisspe-cificationwillensuretheconsistencyofallwafermark-3.6linecharactermisalignment—theverticalingperformedbywafermanufacturers.Thiswillallowdistance,R,betweenthecharacterbaseli

5、nesoftwosimplificationoftheperformancerequirementsofcharactersonthesameline(seeFigure6b).AutomaticOpticalCharacterReading(OCR)equip-ment,provideunassistedandimmediatehumanreada-4ShapeandSizeofMarkingbilitywithoutwaferhandling,andfacilitateresolution4.1Solidlineordotmatrixmethodmaybeusedtoofwaferle

6、velprocessvariations.Thisdocumentdoeswritecharacters.Theminimummatrixshallbe5dotsNOTaddressthemarkingtechniquesthatmaybeem-horizontaland9dotsvertical.Moredotsmaybeused,ployedwhencomplyingwiththisstandard.Themark-uptoandincludingasolidline.Higherdensityisingcodeisintendedtobevalidforabroadrangeofwa

7、-recommendedtoachieveimprovedreadreliability(seeferproducts(i.e.,epi,SOI,processedpolishedwafers).RelatedInformation1).2ReferencedDocuments4.2CharacterDimensionsandSpacing—(seeTable1andFigure1)2.1SEMIStandardsSEM