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1、Solid-StateElectronics49(2005)43–48www.elsevier.com/locate/sseAnovelanalyticalmodelforthebreakdownvoltageofthin-filmSOIpowerMOSFETsa,*aaabWenweiYang,XinhongCheng,YuehuiYu,ZhaoruiSong,DashenShenaShanghaiInstituteofMicrosystemandInformationTechnology,ChineseAcademyofSciences,865ChangningRoad,Shanghai
2、200050,ChinabDepartmentofElectricalandComputerEngineering,UniversityofAlabamainHuntsville,Huntsville,Alabama35899,UnitedStatesReceived1November2003;receivedinrevisedform1June2004ThereviewofthispaperwasarrangedbyProf.S.CristoloveanuAbstractAnovelanalyticalmodelforthesurfacefielddistributionandbreakd
3、ownvoltageofthin-filmsilicononinsulator(SOI)powerMOSFETshasbeenproposed.Theanalyticalsolutionsforthesurfacepotentialandfielddistributionarederivedonthebasisofthetwo-dimensionalPoissonequation.Fromtheseexpressions,thedependenceofbreakdownvoltageonthedeviceparametersiscare-fullyexamined.Thevalidityoft
4、hismodelisdemonstratedbycomparisonwithnumericalsimulationsandexperimentaldata.Com-paredwithotheranalyticalmodels,thisapproachismoresuitabletoexplainthebreakdownbehavior.Ó2004ElsevierLtd.Allrightsreserved.Keywords:SOI;RESURF;Breakdownvoltage;Analyticalmodel1.Introductionsionforbreakdownvoltagecould
5、shortenthedesigncyclebyprovidingaccuratefirst-orderdesignschemesDuetothenumerousadvantagesoverconventionalandphysicalinsightsintothetradeoffsinevitablybulksilicontechnologysuchasspeed,isolationandden-encounteredintheoptimization.Unfortunatelythosesity,silicon-on-insulator(SOI)technologyisattractivee
6、xistinganalyticalmodelshavetodependonsomespe-topowerMOSFETinvariousapplicationsfromhighcialassumptions[10].Forexample,in[11]aparabolicvoltagepowerdevicestoradiofrequencypoweramplifi-potentialapproximationisproposedtoobtaintheers[1–4].Inthosestudiesbreakdownvoltageisalwaysapotentialfunctionbutitisin
7、validtoexplaintheeffectmajorconcern.Thereducedsurfacefield(RESURF)offieldoxide.In[12]somefittingparametershadtoprinciple[5–8]hasbeenextendedtoSOIpowerdevicesbeinducedtoexplainthebreakdownvoltagesaturation.[9],whichar