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ID:39989449
大小:521.66 KB
页数:8页
时间:2019-07-16
《Temperature Control System with Multiclosed Loops for Lithography Projection Lens》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、万方数据CHINESEJOURNALOFMECHANICALENGINEERINGV01.22,No.2,2009·207·IX)I:10.3901/CJME.2009.02.207,availableonlineatwww.ejmeneLeom;WWW.cjmenet.eOlnCllTemperatureControlSystemwithMulti-dosedLoopsforLithographyProjedionLensMEHongfeil,LIXiaopin91一,andHEyan21Sta
2、teKeyLaboratoryofDigitalManufacturingEquipment&Technology,HuazhongUniversity..ofScienceandTechnology,Wuhan430074,China。2TianhuaCollege,ShanghaiNormalUniversity,Shanghai201815,ChhtaReceivedMay27,2008;revisedJanuary8,2009;acceptedJanuary22,2009;publishe
3、delectronicallyFebruary6,2009Abstract:ImagequalityisOneofthemostimportantspecificationsofopticalfithographytoolandisaffectednotablybytemperature,vibration.andcontaminationofprojectionlens(PL).Tradifionalmethodoflocaltemperatureconffoliseasiertointrodu
4、cevibrationandcontaminatioil。sotemperamrecontrolsystemwithmulti-closedloopsisdevelopedtocontrolthetemperatureinsidethePL,andtoisolatetheinfluenceofvibrationandcontamination.Ailewremoteindirect.temperature-control(RITC)methodisproposedinwhichcoolingwat
5、eriscirculatedtoperformindirect-temperature-controlofthePL.HeaterandcoolerembeddedtemperaturecontrolnniKTCU)isusedtoeonditionthetemperatureofthecoolingwatex,andtheTCUmustbekeptawayfromthePLsothattheinfluenceofvibrationandcontaminationcanbeavoided.Ausm
6、ulti-closedloopscontrolstructureincorporatinganinternalcascadecontrolstmcture(CCS)andanexternalparallelcascadecontrolstructure(PCCS)isdesignedtOpreventlargeinertia,multi-delay,andmulti-disturbanceoftheRITCsystem.Anonlinearproportional-integral(Pnalgor
7、ithmisappliedtofurtherellhallcetheconvergencerateandprecisionofthecontrolprocess,Contrastexperimentsofdifferentcontrolloopsandalgorithinswereimplementedtoveilfytheimpactonthecontrolperformance.Itisshownthatthetemperaturecontrolsystemwithmulti-closedlo
8、opsreachesaprecisionspecificationati-0.006℃withfastconvergencerate,strongrobustness,andself-adaptabili哆.删smethodhasbeensuccessfullyusedinanopticallithographytoolwhichproducesapatternof100nmcriticaldimeusion(CD),anditsperformancesaresatisfactor
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