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1、27thEuropeanPhotovoltaicSolarEnergyConferenceandExhibitionADVANCEDANTI-REFLECTIONANDPASSIVATIONLAYERSYSTEMSPRODUCEDBYHIGH-POWERPLASMAINTHENEWMANZPECVDSYSTEM1121121FlorianSchwarz*,RudolfBeckmann,NorbertKohn,SabineNölker,StefanKastl,MarcHofmann,RafelFerré,Thomas112Pernau,HaraldWanka,J
2、ochenRentsch1ManzAG,Steigäckerstrasse5,72768Reutlingen,Germany*phone+4961889543118,fax+4961889543101,fschwarz@manz.com2FraunhoferInstituteforSolarEnergySystems,Heidenhofstrasse2,79110Freiburg,GermanyABSTRACT:Manzhasdevelopedanovelplasmaenhancedchemicalvapourdeposition(PECVD)systemco
3、mbiningboth,highproductivityandbestcoatingquality.Itisbasedonahighpowerplasmasource(HPP)inastaticprocess.Athighpowerdensities,plasmapropertieschangeascomparedtoconventionalequipmentresultinginanimprovedfilmformingmechanism.Inthenewlydevelopedplasmasource,gasconversionfactorsabove80%
4、couldbeobserved,beingthekeyparameterforfilmdepositionathighthroughputs.IncooperationwithFraunhoferISEtheapplicabilityofthesystemhasbeentestedbyanalysingcoatingqualityandperformanceoftypicalpassivationlayersonfrontandbacksideofstandardsolarcells.Forsinglelayera-SiNx:Hanti-reflectionc
5、oatings,efficienciesequaltostate-of-the-artcellscouldbeobtained,17.0%onmultiand18.6%onmonocrystallinematerial.Withanadvancedlayerstackafurtherincreaseof0.1%ispossible.AlsobacksidepassivationstacksofAl2O3andSiNxhavebeenproducedandminoritycarrierlifetimesofupto1.3mscouldbeobtained,cor
6、respondingtoaneffectivesurfacerecombinationvelocityofabout6.0cm/satilluminationdensitiesbelow1sun.Keywords:SiNx,Al2O3,PECVD,passivation,lifetime1INTRODUCTIONcoversiliconnitridecoatingsasthemostwidespreadapplicationinthephotovoltaicindustry,butalsofirstBasedongrowthscenariosforthePVi
7、ndustryresultsonbacksidecoatingsusingAl2O3areshownto(EPIA),technologyroadmapsliketheonepromotedbyemphasizetheflexibilityofthesystem.theSEMIPV-Groupandthehithertoobservedlearningcurve[1,2]anannualcostreductionperWpofabout~10%hastobemaintainedwhilekeepingupwiththe2TECHNOLOGICFUNDAMENT
8、ALScontinuouseffici
