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ID:36463181
大小:1.18 MB
页数:35页
时间:2019-05-10
《VHFPECVD制备大面积硅基薄膜的研究》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、南开大学硕士学位论文VHF-PECVD制备大面积硅基薄膜的研究姓名:王凯杰申请学位级别:硕士专业:微电子与固体电子学指导教师:薛俊明20030528童茎奎兰堡主堑窒皇望、业堡苎一一j堕!!苎2ABSTRACTThesiliconthinfilmshavewidespreadapplicationsinthefieldofphotovoltaicsolarCellsandthin.filmtransistorforflatscreenproduction.Themethodofplasmaenhancedchemicalvapordeposition
2、(PECVD)istheimportanttechniquetoproducethem,buttheconventionalPECVDmethodwith13.56MI-Izexcitationfrequencydoesnotsatisfytheneedofindustrialproduction.TheresearchhasprovedthatthesiliconthinfilmscanbedepositedbyⅧ一PECVDwithlargeareaandhighspeed,Thispapermainlydescribedaboutsevera
3、lworksasfollow:ThemainproblemistheuniformityoflargeareathinfilmswhenweusetheVI-琢-PECVDtodepositedsiliconthinfilms.Themainfactortoaffecttheuniformityofthinfilmsistheuniformityoftheelectricfielddistributionontheelectrode.Thestandingwaveisthemainfactortoaffecttheuniformityoftheel
4、ectricfielddistributionwhentheexcitationfrequencyisintherangeofⅧFIbutweCalleliminatetheaffectofthestandingwavebyselectingtheconnectionpositionofthefeedingline.WedecidetOusethemethodofthefeedinglineconnectwiththeelectrodecenter.Thecharacteroftheamorphoussiliconthinfilmdeposited
5、bythemethodis:theareais23X24cm2,thehomogeneityislessthan±10%.Wehadstudiedhowtoobtainthedevicegradeamorphoussiliconthinfilmwithlargearea,gooduniformityandhighdepositionrateWehadstillstudiedtheaffectsthegaspressure,thepowerandthefluxtotheuniformity,depositionrateandthecharactero
6、fthematerialWefoundthattoincreasethegaspressureproperlycallincreasetheuniformityofthefilms,butthechangesofthepowerhavenoeffecttOtheuniformity.Thedepositionratewillincreasewiththegaspressureandthepowerincreasingproperly.Whenthegaspressureislow,thequalityofthethinfilmsisgoodWesh
7、ouldselectthepowerproperlytoobtmnhi曲qualitythinfilms.Inthebaseofthestudies,weobtainthehighqualityoftheamorphoussiliconthinfilmsonthenormalglassbyoptimifingthedepositionconditionThebestuniformityislessthan±14%Thehighestdepositionis5.5A/sThephotosensitivityis225×105.Keywords:VHF
8、—PECVD,uniformity,amorphoussiliconthinfilm,depositionrate3南开大
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