资源描述:
《用化学镀法制备pd_ag膜时膜厚和组成的控制》由会员上传分享,免费在线阅读,更多相关内容在教育资源-天天文库。
1、第30卷第12期催化学报2009年12月Vol.30No.12ChineseJournalofCatalysisDecember2009文章编号:0253-9837(2009)12-1227-06研究论文:1227~1232用化学镀法制备Pd/Ag膜时膜厚和组成的控制1,21,21曾高峰,史蕾,徐恒泳1中国科学院大连化学物理研究所,辽宁大连1160232中国科学院研究生院,北京1000492+摘要:研究了不同Pd含量的镀液在多孔陶瓷载体上的化学沉积规律,发现当Pd沉积层厚度达到约5μm后,即使镀液中反应2+物的消耗比例很小,膜厚增长也明显变缓,沉积反应主要受膜层表面的催化活
2、性位控制;当镀液中Pd含量只能沉积形成小于2++4μm的Pd膜时,在323K化学镀180min后,镀液中Pd的转化率高于90%.与之相似,当Ag镀液中的Ag含量等于0.5~2++μm的Ag膜层所需量时,在333K化学镀120min后,Ag的转化率可达95%.Ag的高转化率与Ag颗粒的择向生长特性有关.根据Pd和Ag的化学镀沉积规律,通过调节镀液中金属离子的含量能够预先设计和精确控制超薄Pd/Ag膜的膜厚和组成.关键词:钯;银;复合膜;化学镀;膜厚控制;组成控制;沉积规律中图分类号:O643文献标识码:AControlofThicknessandCompositionofPd
3、/AgMembraneduringLayer-by-LayerElectrolessPlating1,21,21,*ZENGGaofeng,SHILei,XUHengyong1DalianInstituteofChemicalPhysics,ChineseAcademyofSciences,Dalian116023,Liaoning,China2GraduateUniversityofChineseAcademyofSciences,Beijing100049,China2+Abstract:ThedepositionrulesofPdwereinvestigateddur
4、ingelectrolessplatinginbathswithdifferentamountsofPd.Itwasdemon-stratedthatthePddepositionratewascontrolledbytheauto-catalyticactivityofthemetallayersurfacewhenthedepositedPdlayerbecame2+2+thickerthan5μmevenifPdintheplatingbathswasfarfrombeingconsumed.WhenthePdamountinthebathwaskeptlowerth
5、anthat2+necessaryforreachingthePdlayerthickness(e.g.correspondingto1–4μmPd),thePdconversioninthebathwashigherthan90%after++reactionfor180min.Furthermore,thesamewasfoundduringAgdepositionfromsilverplatingbathswithalowamountofAg,i.e.Ag+conversionwashigherthan95%afterplatingfor120mininbathsco
6、ntainingAgsufficientforthickAglayerof0.5–2μm.Itwasprovedby+scanningelectronmicroscopymeasurementsthatthehigherconversionsofAgwererelatedtothespecialgrowthpropertiesofAgparticles.AccordingtothedepositionrulesofPdandAg,thethicknessandmetalcompositionofultra-thinPd/Agmembranespreparedbylayer-
7、by-layerelectrolessplatingcouldbepre-designedaswellasaccuratelycontrolledbypreparingrelevantplatingbathwithlowamountsofmetal.Keywords:palladium;silver;compositemembrane;electrolessplating;controlofmembranethickness;controlofmetalcomposition;depositionrule致密Pd及