zrc涂层与其复合涂层的制备和性能分析

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1、硕士学位论文ABSTRACTABSTRACTToimproveanti—ablationbehavioroftheC／Ccomposite，thisreaserchdepositedtheZrCorZrC／SiCfilmfortheprotectfilmontheC／Ccomposition．ZrCfilmwasdepositedbychemicalvapordepositionwithZrCl4-CH4一Arsystem，andZrCl4wastransportedinsolid．ThecharactersoftheSO-preparedZrCfilmwereanalyzedbych

2、emicalthermodynamicscalculatingandexperimenting．Theeffectsofpreparationparametersonthecomposition，surfacemorphologyandmicrostructureofZrCcoatingwerestudiedbyX．raydiffractometry,energydispersivespectroscopyandscanningelectronmicroscopyandsoon，suchasdepositiontemperature，H2gasflux，C／Zrratio，deposi

3、tionpressanddepositionposition，andsetdowntheperfactpreparationtechnics．Themechanicalbehaviorandtheablationbehaviorofthedifferentmicrostructureswerestudiedrespectivelybynano．indetationtestandDR6130oxyacetylenetorch．TheSiCfilmwasregardasthetransitionflimtodecreasetheendogeneticforce．Thereasurchfin

4、dasfollowed：thepreparationmethodinthisreasurchfallsdownthechemicalVapordepositiontemperature．AnditiSeasytogetwidespread、homogeneousZ圮filminstructure．Withthetempreturegoingup，H2gasfluxincreasing，C／Zrratiodecreasinganddepositionpressdecreasing，Ccontentdecreases，thecrystalplane(200)ofZrCfilmgrowspr

5、eferentially,thedensityincreases，therigidityandelasticitysimulationincreasesrespectively11．67and6．32times．ablationratioinlineandmassdecreasesrespectivelybyalargemarginthantheworse．T11edepositionratiogoesupwiththetempretureandtheC／Zrratioincreasing．However,thedepositionratioincreasesfirstly,andth

6、endecreaseswiththeH2gasfluxincreasing．TheresultsshowthattheperfactpreparationtechnicsinpreparatingZrCfilm：thetempreture：1450-1600℃；C／Zr=1；C／H≤1／15；Thedepositionpress：3～5KPa．RelativetothesingleZrCfilm，thecompositefilmchangesunconspicuousinablationratioinline，butdecreases73％inablationratioinmass，a

7、nddiminishinablationcrack．Asaresult，theSiCfilmregardsasthetransitionflimdecreasetheendogeneticforcebetweentheITABSTRACTbehavior硕士学位论文目录目录摘要⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．IABSTRACT．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．