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ID:32466456
大小:3.67 MB
页数:72页
时间:2019-02-06
《磁控溅射法制备硼薄膜和硼纳米线》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库。
1、摘要本文采用磁控溅射法制备硼纳米晶体薄膜和硼纳米非晶薄膜,扫描电子显微镜(SEM)观察这些薄膜的表面形貌,能谱仪(EDS)和选区电子衍射(SAED)表征薄膜的成分,纳米压痕仪(Nanoindentor)测定薄膜的性能;同时,在Au的催化作用下,使用磁控溅射法在硼薄膜上制备晶体硼纳米线,SEM观察纳米线的形貌,EDS、TEM和能量损失谱(EELS)表征了纳米线的成分;最后,系统研究溅射参数对纳米线生长的影响,对纳米线的生长机制也做了相应的研究。不同溅射气压下制备的硼纳米晶体薄膜的表征结果表明,溅射气压的提高有利
2、于薄膜致密化和纳米硬度的提高,但对薄膜的弹性模量的影响不大。不同的基片温度下制备的硼纳米非晶薄膜的表征结果表明,随着基片温度的降低,薄膜上的纳米颗粒逐渐分散,薄膜的弹性模量和纳米硬度也随之降低。最后,对制备的硼纳米线样品进行了研究。研究结果表明,在Au触媒的作用下,生长晶体硼纳米线的临界温度为600℃;提高基片温度和溅射气压,延长溅射时间有利于生长大面积、直径一致的纳米线;纳米线的生长可能由气体一液体一固体(VLS)和气体一团簇一固体(VCS)机制共同控制。关键词磁控溅射;硼;薄膜;纳米线;纳米硬度;弹性模量
3、燕山大学工学硕士学位论文Abstracttnthispaper,crystallineboronfilmsandamorphousboronfilmsweregrownbymagnetronsputtering.Scanningelectronmicroscopy(SEM)equippedwithenergydiffractionspectrum(EDS)isusedtostudythemicrostructureandchemicalcompositionsofthesefilms.Transmission
4、electronmicroscopy(TEM)isemployedfortheselectedareaelectrondiffraction(SAED),Andnanoindentorisusedtomensuratetheelasticity—modulusandnano—hardness.Boronnanowireswerealsofabricatedbymagnetronsputteringwithgoldcatalyst.SEMisemployedtostudythemicrostructure.ED
5、S/TEM/c】ectronenergylossspectrum(EELS)areusedtodetectthechemicalcompositions.TheeffectofsputteringparametersonthegrowthofnanowiresisstudiedsystemicallyandthegrowthmechanismiSalsodiscussed.Theresultssuggestthatwithincreasingofsputteringpressure,boththedensit
6、yandnano—hardnessofthefilmsareimproved,butpressurehaslittleinfluenceontheelasticity-modulus.Theamorphousboronfilmsdepositedatdifferentsubstratetemperaturesshowthatwiththetemperaturedecreasing,theelasticity—modulusandnano-hardnessdecreasebecauseoftheporosity
7、intheboronfilms.Boronnanowiresonthefilmsareinvestigatedindetail.Itcanbeconcludedthatthecriticaltemperatureforthegrowthofnanowiresis600℃.Alongersputteringtime,ahighersubstratetemperatureandahighersputteringpressurearefavorabletoobtainthecrystallineboronnanow
8、ires.Thegrowthofboronnanowiresisprobablycontrolledbycombinationofvapor-liquid—solid(VLS)andvapor-cluster-solid(vcs)mechanisms.Keywordsmagnetronsputtering;boron;film;nanowires;nano-hardness;elasticity—m
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