紫外led光刻光学系统的设计与分析

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1、CONTENTSChineseAbstract⋯．．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．．IEnglishAbstract⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．IIChineseContents．．．．．．⋯⋯⋯⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯．．．．⋯⋯⋯⋯⋯⋯⋯．⋯．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．IVEnglishContents⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．．⋯⋯⋯⋯⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯VIChapterlIntroduction⋯⋯⋯⋯．．⋯⋯⋯⋯⋯⋯⋯⋯⋯．．．⋯⋯⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯

2、⋯．11．1Subjectbackgroud⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．．．．．⋯⋯⋯⋯⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯11．2Thecommonexposurelithography⋯⋯⋯⋯⋯．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．11．：；Researchonlightsourcesystem⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯21．4Theexstingequipmentofprojectionlithographyinourlaboratory⋯⋯⋯⋯⋯⋯⋯⋯．．21．4．1The鼍Fexcimerlaser．．．⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯21．4．2Lig

3、htingopticalsystem．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．⋯．．．．．．．．．．．．．．．．：；1．4．3Theimagingsystemofprojection⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．．31．5Thecontentofthispaper⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．．41．6Thesignificanceofresearch．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．⋯．．．．．．．．．．．．．．．．．．．．．．．

4、．．．．．．．．．．．．．．．．．．．．．．．．．．5Chapter2Thedesignofuniformilluminationsystembasedonaspherielens．．．．．．．．．．．．．．．．．62．1Thekeytechnicalparametersofthelightingsysteminalithographysystem⋯⋯⋯．．62．1．1Effectsoflightingsystem’Saberrationoncharacteristicsoftheoutputlight．62．1．2Requirementsofprojectionlithography

5、onuniformityoflightingsystem⋯．．62．1．3Illuminationsystemandprojectionsystemofthematch⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．62．2Designofasphericlens．．．．．．．⋯．⋯．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．⋯．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．62．2．1Characteristicofthesource⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯62．2．2Opticalprinciple．．．．．．．．．．．．．．

6、．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．72．2．3Selectspatialspherecoodinateforfleesurfaces．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．⋯．．．．．．．．92．2．4EstablishtherelationshipbetweentheLEDsourceandtargetsurface．．．．．．．．．102．2．5Constructionoffree—formsurface⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯

7、⋯⋯⋯⋯⋯．122．2．6SimulationandoptimizationofthedesignedLEDlens．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．．142．3Summaryofthischapter⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯．15Chapter3ProjectionLithographicObjeetiveLenswithSub-·tenmicrometerline··widthl6