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1、CurrentNanoscience,2007,3,177-181177OstwaldRipening:ASyntheticApproachforHollowNanomaterialsHuaChunZeng*DepartmentofChemicalandBiomolecularEngineering,FacultyofEngineering,NationalUniversityofSingapore,10KentRidgeCrescent,Singapore119260Abstract:Fabricationofnanomat
2、erialswithhollowinteriorsisanimportantresearchareainnanoresearch,owingtotheirpotentialap-plicationsinphotonicdevices,drugdelivery,materialencapsulation,ionicintercalation,surfacefunctionalization,nanocatalysts,mem-branenanoreactors,andmanyothertechnologies.Thecommon
3、preparativemethodsforthisnewclassofmaterialscanbebroadlydi-videdintohardandsofttemplate-assistedsyntheses.Inrecentyears,furthermore,theinterestintemplate-freetechniquesforthesemate-rialshasalsoincreased,asthenewprocessesinvolvedinthesetechniquesarerelativelysimplean
4、dlessdemanding,comparedtothetemplate-assistedprocesses.Inthisshortreview,wewillintroducetheapplicationofawell-knownphysicalphenomenonofcrystalgrowth–Ostwaldripening–inthefabricationofhollownanomaterials.Ithasbeendemonstratedthatformationoftheinteriorspacesofnanostru
5、cturesdependsontheaggregativestatesoftheprimarycrystallitesduringthesynthesis.Withthisnewdevelopment,manyinor-ganicnanomaterialswithinteriorspacescannowbefabricatedinsolutionmediatogetherwiththematerialssynthesis.DifferenttypesofOstwaldripeningobservedinthissyntheti
6、capproachhavebeenreviewed.Inparticular,variousgeometricstructuresandconfigurationspreparedwiththesemethodshavebeendiscussed.Thepreparedhollowmaterialsalsoallowfurthercompositionalandstructuralmodifi-cationsunderthesimilarprocessconditions.Futuredirectionsinthisresea
7、rchareaarealsodiscussed.INTRODUCTIONcomplexinteriorspacescanalsobeattainedifthesizedistributionInrecentyears,fabricationofnanomaterialswithhollowinteri-andaggregativepatternsofas-formedprimarycrystallitesareorshasreceivedincreasingattentioninnanoscienceandnanotech-t
8、iered.Inmostcases,however,largecrystallitescanbeconsiderednologyowingtotheirpotentialapplicationsinphotonicdevices,tobeessentiallyimmobile
