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1、Designation:E1558–99(Reapproved2004)StandardGuidefor1ElectrolyticPolishingofMetallographicSpecimensThisstandardisissuedunderthe®xeddesignationE1558;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginaladoptionor,inthecaseofrevision,theyearofl
2、astrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscriptepsilon(e)indicatesaneditorialchangesincethelastrevisionorreapproval.1.Scope4.1.3Therecanbeamarkedsavingoftimeifmany1.1Thisguidedealswithelectrolyticpolishingasameansspecimensofthes
3、amematerialarepolishedsequentially.ofpreparationofspecimensformetallographicpurposes.4.1.4ElectropolishingaselectedareaonthesurfaceofaProceduresaredescribedforpolishingavarietyofmetals.relativelylargemetalpartcanbeaccomplishednondestruc-tively,thatis,without
4、theneedforsectioningtoremoveaN2OTE1ÐReferences(1-133)onelectrolyticpolishingwillprovidethepiece.readerwithspeci®cinformationbeyondthescopeofthisguide.4.1.5Soft,single-phasemetals,whichmaybedifficultto1.2Thisstandarddoesnotpurporttoaddressallofthepolishbymech
5、anicalmethods,maybesuccessfullyelectropol-safetyconcerns,ifany,associatedwithitsuse.Itistheished.responsibilityoftheuserofthisstandardtoestablishappro-4.1.6Thetruemicrostructureofaspecimencanbeobtainedpriatesafetyandhealthpracticesanddeterminetheapplica-beca
6、useartifacts(suchasdisturbedmetal,scratches,andbilityofregulatorylimitationspriortouse.Speci®csafetymechanicaltwins)producedonthesurface,evenbycarefulprecautionsaredescribedinSection5and6.3.1.grindingandmechanicalpolishingoperations,canberemoved.Thesefeature
7、sareimportantinlow-loadhardnesstesting,2.ReferencedDocumentsX-raydiffractionstudies,andinelectronmicroscopy,where2.1ASTMStandards:3higherresolutionputsapremiumonundistortedmetalsur-E7TerminologyRelatingtoMetallographyfaces.E407TestMethodsforMicroetchingMetal
8、sandAlloys4.1.7Afterelectropolishingiscompleted,etchingcanoftenbeaccomplishedbyreducingthevoltage(generallytoabout3.Terminologyone-tenththatrequiredforpolishing)forashorttimebeforeit3.1De®nition