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ID:29726871
大小:46.00 KB
页数:16页
时间:2018-12-22
《硅片行业术语大全(中英文对照+a-z》由会员上传分享,免费在线阅读,更多相关内容在应用文档-天天文库。
1、一、硅片行业术语大全(中英文对照A-H)Acceptor-Anelement,suchasboron,indium,andgalliumusedtocreateafreeholeinasemiconductor.Theacceptoratomsarerequiredtohaveonelessvalenceelectronthanthesemiconductor.受主- 一种用来在半导体中形成空穴的元素,比如硼、铟和镓。受主原子必须比半导体元素少一价电子AlignmentPrecision-Displacementofpatternsthatoccursduringthephotolit
2、hographyprocess.套准精度-在光刻工艺中转移图形的精度。Anisotropic-Aprocessofetchingthathasverylittleornoundercutting各向异性-在蚀刻过程中,只做少量或不做侧向凹刻。AreaContamination-Anyforeignparticlesormaterialthatarefoundonthesurfaceofawafer.Thisisviewedasdiscoloredorsmudged,anditistheresultofstains,fingerprints,waterspots,etc.沾污区域-任何在晶
3、圆片表面的外来粒子或物质。由沾污、手印和水滴产生的污染。Azimuth,inEllipsometry-Theanglemeasuredbetweentheplaneofincidenceandthemajoraxisoftheellipse.椭圆方位角-测量入射面和主晶轴之间的角度。Backside-Thebottomsurfaceofasiliconwafer.(Note:Thistermisnotpreferred;instead,use‘backsurface’.)背面-晶圆片的底部表面。(注:不推荐该术语,建议使用“背部表面”)BaseSiliconLayer-Thesilico
4、nwaferthatislocatedunderneaththeinsulatorlayer,whichsupportsthesiliconfilmontopofthewafer.底部硅层-在绝缘层下部的晶圆片,是顶部硅层的基础。Bipolar-Transistorsthatareabletousebothholesandelectronsaschargecarriers.双极晶体管-能够采用空穴和电子传导电荷的晶体管。BondedWafers-Twosiliconwafersthathavebeenbondedtogetherbysilicondioxide,whichactsasan
5、insulatinglayer.绑定晶圆片-两个晶圆片通过二氧化硅层结合到一起,作为绝缘层。BondingInterface-Theareawherethebondingoftwowafersoccurs.绑定面-两个晶圆片结合的接触区。BuriedLayer-Apathoflowresistanceforacurrentmovinginadevice.Manyofthesedopantsareantimonyandarsenic.埋层-为了电路电流流动而形成的低电阻路径,搀杂剂是锑和砷。BuriedOxideLayer(BOX)-Thelayerthatinsulatesbetween
6、thetwowafers.氧化埋层(BOX)-在两个晶圆片间的绝缘层。Carrier-Valenceholesandconductionelectronsthatarecapableofcarryingachargethroughasolidsurfaceinasiliconwafer.载流子-晶圆片中用来传导电流的空穴或电子。Chemical-MechanicalPolish(CMP)-Aprocessofflatteningandpolishingwafersthatutilizesbothchemicalremovalandmechanicalbuffing.Itisuseddur
7、ingthefabricationprocess.化学-机械抛光(CMP)-平整和抛光晶圆片的工艺,采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。ChuckMark-Amarkfoundoneithersurfaceofawafer,causedbyeitheraroboticendeffector,achuck,orawand.卡盘痕迹-在晶圆片任意表面发现的由机械手、卡盘或托盘造成的痕迹。CleavagePlane-A
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