审审sin审审sic异质结及其光电特性

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1、目录目录1绪论........................................................................……，......................................................……11.15订sic异质结简介.…，.................................................................……，...........············.···，····················……11.25泥ic异质结的研究现状..

2、.........................……，，...............................···..·..·，·····································……41.3本论文的研究目的、内容、创新点...........................···································································……82LPCVD设备、工艺与生长机理分析................................................

3、................................……92.1热壁LPcvD生长设备.....................................……，...……，..........................····································……92.2在siC衬底上异质外延si薄膜的工艺流程.......................................................……，..................……113p一S而一SIC异质结制备与特性表征.........

4、.........................................................................……143.lp一S湘一siC异质结的特性表征及工艺参数对si外延层的影响.........……，，..................................……143.2外延层掺杂浓度控制..................................................……，.........................··.································……174

5、异质结欧姆电极制作..........................................................·············································……224.1欧姆电极制作方法及工艺。，，…..............……，...................................................····.....，··················……224.2sic衬底上电极制备及其接触特性。.....................................

6、.........一“.............····...···················……234.351外延层上电极制备及其接触特性.............................................……，..........……，…，...........……“‘.…~.25sp一51/n一siC异质结光电二极管光电特性测试..................................................................……275.lp一S而一siC异质结光电特性的测试方法................

7、...............................................……，..................……275.2不同掺杂浓度下SFSIC异质结光生电流的测试结果及分析......................................................……275.3工艺改进后的S订siC异质结光生电流.........................................................................