光催化在气体净化中的应用

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1、谢洪勇上海第二工业大学环境与材料工程学院光催化的基本原理OxidationTechnologyConventionalAdvancedOxidantOxidationOxidantOxidationPotentialPotentialCl1.36V·OH2.8V2KMnO1.69V4HO1.77V22O2.07V3F2.87VTiO2.7V22PCOProcessReactantsConductionbandReductioneProductsLighth+ReactantsValenceband

2、OxidationProducts纳米催化的技术优势RecombinationInterfaceTransfer火焰CVD法制备纳米TiO2光催化剂技术EnergyConsumptionofLiquidandGasPhaseMethodIllustrationofTurbulentF-CVDapparatusRutileFractionvs.HeatFluxSizeDistribution光催化在气体净化中的应用TubularPhoto-reactorTiO2filmsbysedimentation

3、methodWeightTiO2300250200Ultrasonic15030min100Sedimentationfor3hoursat502.5mmol/LTiOaqueoussolution2EffFor3hrsec0tivefilm024681012thNumberoflayers(-)ickness(nm)TypicalResults0.70.60.50.4)/3DturnonUVlightseg0.3radatioInletconcentrationn0.2dOutletconcent

4、rationegDegradationdegreereCe0.1(o-)n012345678ceTime(h)ntration(g/mEffectofnumberoflayers352layers3Initialconcentration0.684g/m3layersReletivehumidity80%4layers302520De15gradatio10nd1234567egTime(h)ree(%)filmthicknessandTiO2loading300250200150100Sedime

5、ntationfor3hoursat502.5mmol/LTiOaqueoussolution2Effec0tivefilm024681012thNumberoflayers(-)ickness(nm)TubularPhoto-reactorPhotodegradationofBenzenePhotodegradationofToluenePhotodegradationofAmmonia90residencetime5.7sec380initialNHconcentration2.55mg/m32

6、254nm25mW/cmUVirradiation70238g/cmcatalystloading60rutilefraction500.2310.401400.55130D20egrad10ation0de30354045505560657075greRelativehumidity(%)e(%)PLSpectraEffectofInitialConcentration85807570formaldehyde,400NL/min,relativityhumidity80%65benzene,40

7、0NL/min,relativehumidity80%toluene,400NL/min,relativehumidity60%60methanol,200NL/min,relativehumidity40%55504540353025D20eg15rad10ati5ond0.00.20.40.60.81.01.21.41.61.82.02.22.42.62.83.0eg3rConcentration(g/m)ee(%)氨气光催化实验结果7060rutilemassfraction0.201resi

8、dencetime5.7secrelativehumidity70%502254nm25mW/cmUVirradiation238g/cmcatalystloading403020Degra10dation0de0510152025303540greInitialNHconcentration(mg/m3)e3(%)EffectsofRelativeHumidity80706050formaldehyde40benzenetoluene30methanol20Deg