Annealing Process Dependence of the Self-assembly of Rod-Coil Block Copolymer Thin Films - Shi et al. - Unknown - Unknown

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SupportingInformationAnnealingProcessDependenceoftheSelf-assemblyofRod-CoilBlockCopolymerThinFilmsLing-YingShi,†‡*ChengxiaoYin,BoZhou,†WeiXia,†LinWeng,†andCarolineA.Ross‡*†CollegeofPolymerScienceandEngineering,StateKeyLaboratoryofPolymerMaterialsEngineering,SichuanUniversity,Chengdu610065,China‡DepartmentofMaterialsScienceandEngineering,MassachusettsInstituteofTechnology,77MassachusettsAvenue,Cambridge,Massachusetts02139,UnitedStatesContentsFigureS1.Representativetop-viewSEMimagesofoxidizedPDMSmicrodomainsofS2as-castedDMBCPsthinfilmswithoutannealing.FigureS2.Additionalrepresentativetop-viewSEMimagesshowingoxidizedPDMSS2microdomainsofDMBCPsthinfilmsaftersolventvaporannealingwithdifferentsolventmixture.FigureS3.Representativecross-sectionSEMimagesshowingoxidizedPDMSS3microdomainsoftheD4KM12KthinfilmsafterSVA(a),andafterSVA+TA(b).FigureS4.Representativecross-sectionSEMimagesshowingoxidizedPDMSS3microdomainsoftheD4KM34KthinfilmsafterSVA(A:H=5:1)andafterfollowedthermalannealingat200°Cfor48h.FigureS5.GISAXSandGIWAXSpatternsand(c)thecorrespondingline-cutplotoftheS4D4KM34Kfilmafterthermalannealingat200°Cfor48h.FigureS6.RepresentativeSEMimagesshowingoxidizedPDMSmicrodomainsoftheS4D4KM34Kthinfilmsaftersolventvaporannealing(SVA)withdifferentA:Handasecond-stepthermalannealing(SVA+TA)attheindicatedtemperatures.S1

1FigureS1.Representativetop-viewSEMimagesofoxidizedPDMSmicrodomainsofas-castedDMBCPsthinfilmswithoutannealing.FigureS2.Additionalrepresentativetop-viewSEMimagesshowingoxidizedPDMSmicrodomainsofDMBCPsthinfilmsaftersolventvaporannealingwithdifferentsolventmixture.S2

2FigureS3.Representativecross-sectionSEMimagesshowingoxidizedPDMSmicrodomainsoftheD4KM12KthinfilmsafterSVAwithA:H8:1(a),andafterSVA+TAannealingatdifferenttemperature(b).ThemagnifiedSEMintherightsideclearlyindicatedthedistortionofthecylindersformedfromSVA,andthecylindersfromthermalannealedpresenthexagonalarrangementwithoutdistortion.FigureS4.Representativecross-sectionSEMimagesshowingoxidizedPDMSmicrodomainsoftheS3

3D4KM34KthinfilmsafterSVA(A:H=5:1)andafterfollowedthermalannealingat200°Cfor48h.FigureS5.(a)GISAXSand(b)GIWAXSpatternsand(c)thecorrespondingline-cutplotoftheD4KM34Kfilmafterthermalannealingat200°Cfor48h.FigureS6.RepresentativeSEMimagesshowingoxidizedPDMSmicrodomainsoftheD4KM34Kthinfilmsaftersolventvaporannealing(SVA)withdifferentA:Handasecond-stepthermalannealing(SVA+TA)attheindicatedtemperatures.S4